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Brief Report

Developing GLAD Parameters to Control the Deposition of Nanostructured Thin Film

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Biomarkers Analysis LAB, Institute of Electronics, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059 Krakow, Poland
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Advanced Diagnostic Equipment Sp. z o.o., ul. W. Weissa 7/C1, 31-339 Krakow, Poland
*
Author to whom correspondence should be addressed.
Academic Editor: Michael Tiemann
Sensors 2022, 22(2), 651; https://doi.org/10.3390/s22020651 (registering DOI)
Received: 16 December 2021 / Revised: 10 January 2022 / Accepted: 11 January 2022 / Published: 14 January 2022
(This article belongs to the Special Issue Metal Oxide-Based Gas Sensors)
In this paper, we describe the device developed to control the deposition parameters to manage the glancing angle deposition (GLAD) process of metal-oxide thin films for gas-sensing applications. The GLAD technique is based on a set of parameters such as the tilt, rotation, and substrate temperature. All parameters are crucial to control the deposition of nanostructured thin films. Therefore, the developed GLAD controller enables the control of all parameters by the scientist during the deposition. Additionally, commercially available vacuum components were used, including a three-axis manipulator. High-precision readings were tested, where the relative errors calculated using the parameters provided by the manufacturer were 1.5% and 1.9% for left and right directions, respectively. However, thanks to the formula developed by our team, the values were decreased to 0.8% and 0.69%, respectively. View Full-Text
Keywords: glancing angle deposition; magnetron sputtering; thin films; metal oxides; gas sensors glancing angle deposition; magnetron sputtering; thin films; metal oxides; gas sensors
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MDPI and ACS Style

Bronicki, J.; Grochala, D.; Rydosz, A. Developing GLAD Parameters to Control the Deposition of Nanostructured Thin Film. Sensors 2022, 22, 651. https://doi.org/10.3390/s22020651

AMA Style

Bronicki J, Grochala D, Rydosz A. Developing GLAD Parameters to Control the Deposition of Nanostructured Thin Film. Sensors. 2022; 22(2):651. https://doi.org/10.3390/s22020651

Chicago/Turabian Style

Bronicki, Jakub, Dominik Grochala, and Artur Rydosz. 2022. "Developing GLAD Parameters to Control the Deposition of Nanostructured Thin Film" Sensors 22, no. 2: 651. https://doi.org/10.3390/s22020651

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