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Amphiphilic DNA Organic Hybrids: Functional Materials in Nanoscience and Potential Application in Biomedicine
Open AccessArticle

Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami

1
Micron School of Materials Science & Engineering, Boise State University, Boise, ID 83725, USA
2
Department of Electrical & Computer Engineering, Boise State University, Boise, ID 83725, USA
3
Micron Technology, Inc., 8000 South Federal Way, Boise, ID 83707-0006, USA
*
Author to whom correspondence should be addressed.
Int. J. Mol. Sci. 2018, 19(9), 2513; https://doi.org/10.3390/ijms19092513
Received: 23 July 2018 / Accepted: 23 August 2018 / Published: 24 August 2018
(This article belongs to the Special Issue Nucleic Acid Nanotechnology)
DNA nanostructures routinely self-assemble with sub-10 nm feature sizes. This capability has created industry interest in using DNA as a lithographic mask, yet with few exceptions, solution-based deposition of DNA nanostructures has remained primarily academic to date. En route to controlled adsorption of DNA patterns onto manufactured substrates, deposition and placement of DNA origami has been demonstrated on chemically functionalized silicon substrates. While compelling, chemical functionalization adds fabrication complexity that limits mask efficiency and hence industry adoption. As an alternative, we developed an ion implantation process that tailors the surface potential of silicon substrates to facilitate adsorption of DNA nanostructures without the need for chemical functionalization. Industry standard 300 mm silicon wafers were processed, and we showed controlled adsorption of DNA origami onto boron-implanted silicon patterns; selective to a surrounding silicon oxide matrix. The hydrophilic substrate achieves very high surface selectivity by exploiting pH-dependent protonation of silanol-groups on silicon dioxide (SiO2), across a range of solution pH values and magnesium chloride (MgCl2) buffer concentrations. View Full-Text
Keywords: molecular self-assembly; DNA nanotechnology; DNA origami; electrostatics; semiconductor molecular self-assembly; DNA nanotechnology; DNA origami; electrostatics; semiconductor
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Takabayashi, S.; Kotani, S.; Flores-Estrada, J.; Spears, E.; Padilla, J.E.; Godwin, L.C.; Graugnard, E.; Kuang, W.; Sills, S.; Hughes, W.L. Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami. Int. J. Mol. Sci. 2018, 19, 2513.

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