Next Article in Journal
Liquid Biopsy Biomarkers in Bladder Cancer: A Current Need for Patient Diagnosis and Monitoring
Next Article in Special Issue
Towards a Bioelectronic Computer: A Theoretical Study of a Multi-Layer Biomolecular Computing System That Can Process Electronic Inputs
Previous Article in Journal
Exploring the Role of Fallopian Ciliated Cells in the Pathogenesis of High-Grade Serous Ovarian Cancer
Previous Article in Special Issue
Amphiphilic DNA Organic Hybrids: Functional Materials in Nanoscience and Potential Application in Biomedicine
Article Menu
Issue 9 (September) cover image

Export Article

Open AccessArticle
Int. J. Mol. Sci. 2018, 19(9), 2513; https://doi.org/10.3390/ijms19092513

Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami

1
Micron School of Materials Science & Engineering, Boise State University, Boise, ID 83725, USA
2
Department of Electrical & Computer Engineering, Boise State University, Boise, ID 83725, USA
3
Micron Technology, Inc., 8000 South Federal Way, Boise, ID 83707-0006, USA
*
Author to whom correspondence should be addressed.
Received: 23 July 2018 / Accepted: 23 August 2018 / Published: 24 August 2018
(This article belongs to the Special Issue Nucleic Acid Nanotechnology)
Full-Text   |   PDF [4956 KB, uploaded 27 August 2018]   |  

Abstract

DNA nanostructures routinely self-assemble with sub-10 nm feature sizes. This capability has created industry interest in using DNA as a lithographic mask, yet with few exceptions, solution-based deposition of DNA nanostructures has remained primarily academic to date. En route to controlled adsorption of DNA patterns onto manufactured substrates, deposition and placement of DNA origami has been demonstrated on chemically functionalized silicon substrates. While compelling, chemical functionalization adds fabrication complexity that limits mask efficiency and hence industry adoption. As an alternative, we developed an ion implantation process that tailors the surface potential of silicon substrates to facilitate adsorption of DNA nanostructures without the need for chemical functionalization. Industry standard 300 mm silicon wafers were processed, and we showed controlled adsorption of DNA origami onto boron-implanted silicon patterns; selective to a surrounding silicon oxide matrix. The hydrophilic substrate achieves very high surface selectivity by exploiting pH-dependent protonation of silanol-groups on silicon dioxide (SiO2), across a range of solution pH values and magnesium chloride (MgCl2) buffer concentrations. View Full-Text
Keywords: molecular self-assembly; DNA nanotechnology; DNA origami; electrostatics; semiconductor molecular self-assembly; DNA nanotechnology; DNA origami; electrostatics; semiconductor
Figures

Graphical abstract

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

Supplementary material

SciFeed

Share & Cite This Article

MDPI and ACS Style

Takabayashi, S.; Kotani, S.; Flores-Estrada, J.; Spears, E.; Padilla, J.E.; Godwin, L.C.; Graugnard, E.; Kuang, W.; Sills, S.; Hughes, W.L. Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami. Int. J. Mol. Sci. 2018, 19, 2513.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics

1

Comments

[Return to top]
Int. J. Mol. Sci. EISSN 1422-0067 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top