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Journal: Molecules, 2022
Volume: 27
Number: 8123
8123
Article: Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures
Authors: by Fang-Bin Ren, Shi-Cong Jiang, Chia-Hsun Hsu, Xiao-Ying Zhang, Peng Gao, Wan-Yu Wu, Yi-Jui Chiu, Shui-Yang Lien and Wen-Zhang Zhu
Link: https://www.mdpi.com/1420-3049/27/23/8123

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