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Keywords = vacuum chuck

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16 pages, 4052 KiB  
Article
Development of Wafer-Type Plasma Monitoring Sensor with Automated Robot Arm Transfer Capability for Two-Dimensional In Situ Processing Plasma Diagnosis
by Haewook Park, Juhyun Kim, Sungwon Cho, Kyunghyun Kim, Sungho Jang, Younsok Choi and Hohyun Lee
Sensors 2024, 24(6), 1786; https://doi.org/10.3390/s24061786 - 10 Mar 2024
Cited by 1 | Viewed by 2352
Abstract
In this work, we propose our newly developed wafer-type plasma monitoring sensor based on a floating-type double probe method that can be useful for two-dimensional (2D) in situ plasma diagnosis within a semiconductor processing chamber. A key achievement of this work is the [...] Read more.
In this work, we propose our newly developed wafer-type plasma monitoring sensor based on a floating-type double probe method that can be useful for two-dimensional (2D) in situ plasma diagnosis within a semiconductor processing chamber. A key achievement of this work is the first realization of an ultra-thin plasma monitoring sensor with a system thickness of ~1.4 mm, which supports a fully automated robot arm transfer capability for in situ plasma diagnosis. To the best of our knowledge, it is the thinnest accomplishment among all wafer-type plasma monitoring sensors. Our proposed sensor is assembled with two Si wafers and SiO2-based probes; accordingly, it makes it possible to monitor the actual dynamics of processing plasmas under electrostatic chucking (ESC) conditions. Also, it allows for the prevention of chamber contamination issues after continuously exposing the radio frequency (RF) to various processing gases. Using a test-bed chamber, we successfully demonstrated the feasibility and system performance of the proposed sensor, including robot arm transfer capability, vacuum and thermal stress durability, and data integrity and reproducibility. Consequently, compared with the conventional plasma diagnostic tools, we expect that our proposed sensor will be highly beneficial for tool-to-tool matching (TTTM) and/or for studying various plasma-related items by more accurately providing the parameters of processing plasmas, further saving both time and manpower resources required for preventive maintenance (PM) routines as well. Full article
(This article belongs to the Section Industrial Sensors)
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10 pages, 4093 KiB  
Article
On-Wafer Temperature Monitoring Sensor for Condition Monitoring of Repaired Electrostatic Chuck
by Jae-Hwan Kim, Yoonsung Koo, Wansoo Song and Sang Jeen Hong
Electronics 2022, 11(6), 880; https://doi.org/10.3390/electronics11060880 - 10 Mar 2022
Cited by 11 | Viewed by 11819
Abstract
The temperature of electrostatic chuck (ESC), a wafer susceptor used in semiconductor etch equipment, must accurately control the temperature of wafers during the etching process to obtain uniform and consistent process results. Failure to control the precise temperature can lead to rejection from [...] Read more.
The temperature of electrostatic chuck (ESC), a wafer susceptor used in semiconductor etch equipment, must accurately control the temperature of wafers during the etching process to obtain uniform and consistent process results. Failure to control the precise temperature can lead to rejection from the high-volume semiconductor manufacturing site (one of the most high-cost equipment components which can be repaired for its extended use). In this research, we propose a wireless-type on-wafer temperature monitoring system (OTMS) for easier and faster temperature monitoring to help temperature measurements of the repaired ESC in atmospheric and vacuum conditions. The proposed method, which can effectively measure the temperature distribution of the ESC, should manage the operational condition of ESC. A successful demonstration of the 300 mm size OTMS for the repaired parts enhanced the quality assurance with a temperature deviation of ±3.83 °C over 65 points of measurement. Full article
(This article belongs to the Special Issue Advances in Machine Condition Monitoring and Fault Diagnosis)
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14 pages, 5993 KiB  
Article
On-Machine Measurement for Surface Flatness of Transparent and Thin Film in Laser Ablation Process
by HyungTae Kim, Yoon Jae Moon, Heuiseok Kang and Jun Yong Hwang
Coatings 2020, 10(9), 885; https://doi.org/10.3390/coatings10090885 - 14 Sep 2020
Cited by 3 | Viewed by 3945
Abstract
In printed electronics, laser ablation is used to repair defective patterns on transparent, flexible, and thin films, using high-power lasers. The distance between the film surface and laser focus is sensitive to changes as the narrow focus depth of the lens is the [...] Read more.
In printed electronics, laser ablation is used to repair defective patterns on transparent, flexible, and thin films, using high-power lasers. The distance between the film surface and laser focus is sensitive to changes as the narrow focus depth of the lens is the range of tens of microns. However, a film fixed on a conductive vacuum chuck (CVC) is always curved, owing to chucking bending; thus, laser focusing must be locally performed before ablation. Therefore, this study proposes a non-contact measurement method for the surface flatness of a transparent and thin film, to compensate for laser defocusing in a large area. The surface flatness was obtained using camera-focus points on the porous surface of the CVC. The focus points were interpolated to achieve a smooth and continuous surface flatness for chucking bending. A laser distance sensor was used to verify the surface flatness from the proposed method. The surface flatness was used to inspect the printed patterns, and to perform laser ablation on the film. The proposed method is advantageous for large-area laser ablation and is expected to become indispensable for repairing machines in printed electronics. Full article
(This article belongs to the Special Issue Electro-Optical Performance of Organic Thin Films)
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17 pages, 3478 KiB  
Article
Micro Vacuum Chuck and Tensile Test System for Bio-Mechanical Evaluation of 3D Tissue Constructed of Human Induced Pluripotent Stem Cell-Derived Cardiomyocytes (hiPS-CM)
by Kaoru Uesugi, Fumiaki Shima, Ken Fukumoto, Ayami Hiura, Yoshinari Tsukamoto, Shigeru Miyagawa, Yoshiki Sawa, Takami Akagi, Mitsuru Akashi and Keisuke Morishima
Micromachines 2019, 10(7), 487; https://doi.org/10.3390/mi10070487 - 19 Jul 2019
Cited by 12 | Viewed by 5380
Abstract
In this report, we propose a micro vacuum chuck (MVC) which can connect three-dimensional (3D) tissues to a tensile test system by vacuum pressure. Because the MVC fixes the 3D tissue by vacuum pressure generated on multiple vacuum holes, it is expected that [...] Read more.
In this report, we propose a micro vacuum chuck (MVC) which can connect three-dimensional (3D) tissues to a tensile test system by vacuum pressure. Because the MVC fixes the 3D tissue by vacuum pressure generated on multiple vacuum holes, it is expected that the MVC can fix 3D tissue to the system easily and mitigate the damage which can happen by handling during fixing. In order to decide optimum conditions for the size of the vacuum holes and the vacuum pressure, various sized vacuum holes and vacuum pressures were applied to a normal human cardiac fibroblast 3D tissue. From the results, we confirmed that a square shape with 100 µm sides was better for fixing the 3D tissue. Then we mounted our developed MVCs on a specially developed tensile test system and measured the bio-mechanical property (beating force) of cardiac 3D tissue which was constructed of human induced pluripotent stem cell-derived cardiomyocytes (hiPS-CM); the 3D tissue had been assembled by the layer-by-layer (LbL) method. We measured the beating force of the cardiac 3D tissue and confirmed the measured force followed the Frank-Starling relationship. This indicates that the beating property of cardiac 3D tissue obtained by the LbL method was close to that of native cardiac tissue. Full article
(This article belongs to the Special Issue Organs-on-chips)
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