Search Results (6)

Laser ranging technology holds a key position in the military, aerospace, and industrial fields due to its high precision and non-contact measurement characteristics. As a core component, the performance of the photon detector directly determines the ranging accuracy and range. This paper systematically reviews the technological development of photonic detectors for laser ranging, with a focus on analyzing the working principles and performance differences of traditional photodiodes [PN (P-N junction photodiode), PIN (P-intrinsic-N photodiode), and APD (avalanche photodiode)] (such as the high-frequency response characteristics of PIN and the internal gain mechanism of APD), as well as their applications in short- and medium-range scenarios. Additionally, this paper discusses the unique advantages of special structures such as transmitting junction-type and Schottky-type detectors in applications like ultraviolet light detection. This article focuses on photon counting technology, reviewing the technological evolution of photomultiplier tubes (PMTs), single-photon avalanche diodes (SPADs), and superconducting nanowire single-photon detectors (SNSPDs). PMT achieves single-photon detection based on the external photoelectric effect but is limited by volume and anti-interference capability. SPAD achieves sub-decimeter accuracy in 100 km lidars through Geiger mode avalanche doubling, but it faces challenges in dark counting and temperature control. SNSPD, relying on the characteristics of superconducting materials, achieves a detection efficiency of 95% and a dark count rate of less than 1 cps in the 1550 nm band. It has been successfully applied in cutting-edge fields such as 3000 km satellite ranging (with an accuracy of 8 mm) and has broken through the near-infrared bottleneck. This study compares the differences among various detectors in core indicators such as ranging error and spectral response, and looks forward to the future technical paths aimed at improving the resolution of photon numbers and expanding the full-spectrum detection capabilities. It points out that the new generation of detectors represented by SNSPD, through material and process innovations, is promoting laser ranging to leap towards longer distances, higher precision, and wider spectral bands. It has significant application potential in fields such as space debris monitoring. Full article

In this study, a novel silicon carbide (SiC) double-trench MOSFET (DT-MOS) combined Schottky barrier diode (SBD) and MOS-channel diode (MCD) is proposed and investigated using TCAD simulations. The integrated MCD helps inactivate the parasitic body diode when the device is utilized as a freewheeling diode, eliminating bipolar degradation. The adjustment of SBD position provides an alternative path for reverse conduction and mitigates the electric field distribution near the bottom source trench region. As a result of the Schottky contact adjustment, the reverse conduction characteristics are less influenced by the source oxide thickness, and the breakdown voltage (BV) is largely improved from 800 V to 1069 V. The gate-to-drain capacitance is much lower due to the removal of the bottom oxide, bringing an improvement to the turn-on switching rise time from 2.58 ns to 0.68 ns. These optimized performances indicate the proposed structure with both SBD and MCD has advantages in switching and breakdown characteristics. Full article

Achieving low conduction loss and good channel mobility is crucial for SiC MOSFETs. However, basic planar SiC MOSFETs provide challenges due to their high density of interface traps and significant gate-to-drain capacitance. In order to enhance the reverse recovery property of the device, a Schottky barrier diode (SBD) was added to the source contact area, the top of the current spreading region, of a trench-etched double-diffused SiC MOS (TED MOS). Two types of SBD structures were optimized to improve the electrical properties using 3D simulation software, “TCAD Silvaco”. During reverse recovery simulation, the carriers of the device were withdrawn from the SBD, indicating that the new design was effective. It also showed that the recovery properties of the new design depended on temperature, carrier lifetime, and the work functions of metals. All the new designs were evaluated in various circumstances to determine the trend. Ultimately, in high-speed switching circuits, the SiC TED MOS with SBD structure efficiently boosted switching speed, while reducing switching loss. Full article

Super-high dielectric constant (k) AlO_x/TiO_y nanolaminates (ATO NLs) are deposited by an atomic layer deposition technique for application in next-generation electronics. Individual multilayers with uniform thicknesses are formed for the ATO NLs. With an increase in AlO_x content in each ATO sublayer, the shape of the Raman spectrum has a tendency to approach that of a single AlO_x layer. The effects of ATO NL deposition conditions on the electrical properties of the metal/ATO NL/metal capacitors were investigated. A lower deposition temperature, thicker ATO NL, and lower TiO_y content in each ATO sublayer can lead to a lower leakage current and smaller loss tangent at 1 kHz for the capacitors. A higher deposition temperature, larger number of ATO interfaces, and higher TiO_y content in each ATO sublayer are important for obtaining higher k values for the ATO NLs. With an increase in resistance in the capacitors, the ATO NLs vary from semiconductors to insulators and their k values have a tendency to decrease. For most of the capacitors, the capacitances reduce with increments in absolute measurement voltage. There are semi-circular shapes for the impedance spectra of the capacitors. By fitting them with the equivalent circuit, it is observed that with the increase in absolute voltage, both parallel resistance and capacitance decrease. The variation in the capacitance is explained well by a novel double-Schottky electrode contact model. The formation of super-high k values for the semiconducting ATO NLs is possibly attributed to the accumulation of charges. Full article

We propose an ambipolar chitosan synaptic transistor that effectively responds to binary neuroplasticity. We fabricated the synaptic transistors by applying a chitosan electric double layer (EDL) to the gate insulator of the excimer laser annealed polycrystalline silicon (poly-Si) thin-film transistor (TFT) with Ni-silicide (NiSi) Schottky-barrier source/drain (S/D) junction. The undoped poly-Si channel and the NiSi S/D contact allowed conduction by electrons and holes, resulting in artificial synaptic behavior in both p-type and n-type regions. A slow polarization reaction by the mobile ions such as anions (CH₃COO⁻ and OH⁻) and cations (H⁺) in the chitosan EDL induced hysteresis window in the transfer characteristics of the ambipolar TFTs. We demonstrated the excitatory post-synaptic current modulations and stable conductance modulation through repetitive potentiation and depression pulse. We expect the proposed ambipolar chitosan synaptic transistor that responds effectively to both positive and negative stimulation signals to provide more complex information process versatility for bio-inspired neuromorphic computing systems. Full article

In order to improve the corrosion and wear resistance of biomedical Ti-6Al-4V implants, a Ta₂N nanoceramic coating was synthesized on a Ti-6Al-4V substrate by the double glow discharge plasma process. The Ta₂N coating, composed of fine nanocrystals, with an average grain size of 12.8 nm, improved the surface hardness of Ti-6Al-4V and showed good contact damage tolerance and good adhesion strength to the substrate. The corrosion resistance of the Ta₂N coating in Ringer’s physiological solution at 37 °C was evaluated by different electrochemical techniques: potentiodynamic polarization, electrochemical impedance spectroscopy (EIS), potentiostatic polarization and capacitance measurements (Mott-Schottky approach). The evolution of the surface composition of the passive films at different applied potentials was determined by X-ray photoelectron spectroscopy (XPS). The results indicated that the Ta₂N coating showed higher corrosion resistance than both commercially pure Ta and uncoated Ti-6Al-4V in this solution, because of the formed oxide film on the Ta₂N coating having a smaller carrier density (N_d) and diffusivity (D_o) of point defects. The composition of the surface passive film formed on the Ta₂N coating changed with the applied potential. At low applied potentials, the oxidation of the Ta₂N coating led to the formation of tantalum oxynitride (TaO_xN_y) but, subsequently, the tantalum oxynitride (TaO_xN_y) could be chemically converted to Ta₂O₅ at higher applied potentials. Full article