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Journal: ChemistryVolume: 5Number: 138
Article: In Pursuit of Next Generation N-Heterocyclic Carbene-Stabilized Copper and Silver Precursors for Metalorganic Chemical Vapor Deposition and Atomic Layer Deposition Processes
  • Authors:
  • Ilamparithy Selvakumar1,†,
  • Nils Boysen2,† and
  • Marco Bürger1
  • et al.
Link: https://www.mdpi.com/2624-8549/5/3/138

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