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Journal: Chemistry, 2023
Volume: 5
Number: 138
Article:
In Pursuit of Next Generation N-Heterocyclic Carbene-Stabilized Copper and Silver Precursors for Metalorganic Chemical Vapor Deposition and Atomic Layer Deposition Processes
Authors:
by
Ilamparithy Selvakumar, Nils Boysen, Marco Bürger and Anjana Devi
Link:
https://www.mdpi.com/2624-8549/5/3/138
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