DNA-Origami-Aided Lithography for Sub-10 Nanometer Pattern Printing†
by
Isaac Gállego 1,*, Brendan Manning 1, Joan Daniel Prades 2,*
, Mònica Mir 3,4, Josep Samitier 2,3,4 and Ramon Eritja 1,4,*
Isaac Gállego 1,*, Brendan Manning 1, Joan Daniel Prades 2,*, Mònica Mir 3,4, Josep Samitier 2,3,4 and Ramon Eritja 1,4,*
1
Institute for Advanced Chemistry of Catalonia (IQAC), Spanish National Research Council (CSIC), Spain
2
Department of Engineering: Electronics, University of Barcelona, Barcelona, Spain
3
Nanobioengineering Laboratory, Institute for Bioengineering of Catalonia (IBEC), Barcelona, Spain
4
Networking Center in Bioengineering, Biomaterials and Nanomedicine (CIBER-BBN), Barcelona, Spain
*
Authors to whom correspondence should be addressed.
†
Presented at the Eurosensors 2017 Conference, Paris, France, 3–6 September 2017.
Proceedings 2017, 1(4), 325; https://doi.org/10.3390/proceedings1040325
Published: 8 August 2017
(This article belongs to the Proceedings of Eurosensors)
We report the first DNA-based origami technique that can print addressable patterns on surfaces with sub-10 nm resolution. Specifically, we have used a two-dimensional DNA origami as a template (DNA origami stamp) to transfer DNA with pre-programmed patterns (DNA ink) on gold surfaces. The DNA ink is composed of thiol-modified staple strands incorporated at specific positions of the DNA origami stamp to create patterns upon thiol-gold bond formation on the surface (DNA ink). The DNA pattern formed is composed of unique oligonucleotide sequences, each of which is individually addressable. As a proof-of-concept, we created a linear pattern of oligonucleotide-modified gold nanoparticles complementary to the DNA ink pattern. We have developed an in silico model to identify key elements in the formation of our DNA origami-driven lithography and nanoparticle patterning as well as simulate more complex nanoparticle patterns on surfaces.
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited
MDPI and ACS Style
Gállego, I.; Manning, B.; Prades, J.D.; Mir, M.; Samitier, J.; Eritja, R. DNA-Origami-Aided Lithography for Sub-10 Nanometer Pattern Printing. Proceedings 2017, 1, 325.
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