Wu, Z.; Xiong, Y.; Lei, L.; Tan, W.; Tang, Z.; Deng, X.; Cheng, X.; Li, T.
Sub-5 nm AFM Tip Characterizer Based on Multilayer Deposition Technology. Photonics 2022, 9, 665.
https://doi.org/10.3390/photonics9090665
AMA Style
Wu Z, Xiong Y, Lei L, Tan W, Tang Z, Deng X, Cheng X, Li T.
Sub-5 nm AFM Tip Characterizer Based on Multilayer Deposition Technology. Photonics. 2022; 9(9):665.
https://doi.org/10.3390/photonics9090665
Chicago/Turabian Style
Wu, Ziruo, Yingfan Xiong, Lihua Lei, Wen Tan, Zhaohui Tang, Xiao Deng, Xinbin Cheng, and Tongbao Li.
2022. "Sub-5 nm AFM Tip Characterizer Based on Multilayer Deposition Technology" Photonics 9, no. 9: 665.
https://doi.org/10.3390/photonics9090665
APA Style
Wu, Z., Xiong, Y., Lei, L., Tan, W., Tang, Z., Deng, X., Cheng, X., & Li, T.
(2022). Sub-5 nm AFM Tip Characterizer Based on Multilayer Deposition Technology. Photonics, 9(9), 665.
https://doi.org/10.3390/photonics9090665