Wang, K.; Li, J.; Huang, Y.; Lian, M.; Chen, D.
Adsorption of NO Gas Molecules on Monolayer Arsenene Doped with Al, B, S and Si: A First-Principles Study. Processes 2019, 7, 538.
https://doi.org/10.3390/pr7080538
AMA Style
Wang K, Li J, Huang Y, Lian M, Chen D.
Adsorption of NO Gas Molecules on Monolayer Arsenene Doped with Al, B, S and Si: A First-Principles Study. Processes. 2019; 7(8):538.
https://doi.org/10.3390/pr7080538
Chicago/Turabian Style
Wang, Keliang, Jing Li, Yu Huang, Minglei Lian, and Dingmei Chen.
2019. "Adsorption of NO Gas Molecules on Monolayer Arsenene Doped with Al, B, S and Si: A First-Principles Study" Processes 7, no. 8: 538.
https://doi.org/10.3390/pr7080538
APA Style
Wang, K., Li, J., Huang, Y., Lian, M., & Chen, D.
(2019). Adsorption of NO Gas Molecules on Monolayer Arsenene Doped with Al, B, S and Si: A First-Principles Study. Processes, 7(8), 538.
https://doi.org/10.3390/pr7080538