Piller, C.-T.; Raud, J.; Aarik, L.; Jõgi, I.; Talviste, R.; Aarik, J.
Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3. Processes 2024, 12, 612.
https://doi.org/10.3390/pr12030612
AMA Style
Piller C-T, Raud J, Aarik L, Jõgi I, Talviste R, Aarik J.
Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3. Processes. 2024; 12(3):612.
https://doi.org/10.3390/pr12030612
Chicago/Turabian Style
Piller, Carl-Thomas, Jüri Raud, Lauri Aarik, Indrek Jõgi, Rasmus Talviste, and Jaan Aarik.
2024. "Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3" Processes 12, no. 3: 612.
https://doi.org/10.3390/pr12030612
APA Style
Piller, C.-T., Raud, J., Aarik, L., Jõgi, I., Talviste, R., & Aarik, J.
(2024). Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3. Processes, 12(3), 612.
https://doi.org/10.3390/pr12030612