Piller, C.-T.;                     Raud, J.;                     Aarik, L.;                     Jõgi, I.;                     Talviste, R.;                     Aarik, J.    
        Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3. Processes 2024, 12, 612.
    https://doi.org/10.3390/pr12030612
    AMA Style
    
                                Piller C-T,                                 Raud J,                                 Aarik L,                                 Jõgi I,                                 Talviste R,                                 Aarik J.        
                Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3. Processes. 2024; 12(3):612.
        https://doi.org/10.3390/pr12030612
    
    Chicago/Turabian Style
    
                                Piller, Carl-Thomas,                                 Jüri Raud,                                 Lauri Aarik,                                 Indrek Jõgi,                                 Rasmus Talviste,                                 and Jaan Aarik.        
                2024. "Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3" Processes 12, no. 3: 612.
        https://doi.org/10.3390/pr12030612
    
    APA Style
    
                                Piller, C.-T.,                                 Raud, J.,                                 Aarik, L.,                                 Jõgi, I.,                                 Talviste, R.,                                 & Aarik, J.        
        
        (2024). Study of Mid-Pressure Ar Radiofrequency Plasma Used in Plasma-Enhanced Atomic Layer Deposition of α-Al2O3. Processes, 12(3), 612.
        https://doi.org/10.3390/pr12030612