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Journal: Processes, 2023
Volume: 11
Number: 1175

Article: Expanding Measuring Range of LWD Resistivity Instrument in High Permittivity Layers
Authors: by Chengquan Gao, Dong Wu, Jichun Liu, Quan He and Rui Deng
Link: https://www.mdpi.com/2227-9717/11/4/1175

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