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Journal: Electronics, 2024
Volume: 13
Number: 2391
Article:
Effects of Fe Contamination on the Reliability of Gate Oxide Integrity in Advanced CMOS Technology
Authors:
by
Fan Wang, Minghai Fang, Peng Yu, Wenbin Zhou, Kaiwei Cao, Zhen Xie, Xiangze Liu, Feng Yan and Xiaoli Ji
Link:
https://www.mdpi.com/2079-9292/13/12/2391
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