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Xie X, Qi J, Wang H, Liu Z, Wu W, Lee C, Zhao Y. The Excellent Bending Limit of a Flexible Si-Based Hf_0.5Zr_0.5O₂ Ferroelectric Capacitor with an Al Buffer Layer. Electronics. 2024; 13(1):24. https://doi.org/10.3390/electronics13010024

Xie, Xinyu, Jiabin Qi, Hui Wang, Zongfang Liu, Wenhao Wu, Choonghyun Lee, and Yi Zhao. 2024. "The Excellent Bending Limit of a Flexible Si-Based Hf_0.5Zr_0.5O₂ Ferroelectric Capacitor with an Al Buffer Layer" Electronics 13, no. 1: 24. https://doi.org/10.3390/electronics13010024

Xie, X., Qi, J., Wang, H., Liu, Z., Wu, W., Lee, C., & Zhao, Y. (2024). The Excellent Bending Limit of a Flexible Si-Based Hf_0.5Zr_0.5O₂ Ferroelectric Capacitor with an Al Buffer Layer. Electronics, 13(1), 24. https://doi.org/10.3390/electronics13010024