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Journal: ElectronicsVolume: 13Number: 24
Article: The Excellent Bending Limit of a Flexible Si-Based Hf0.5Zr0.5O2 Ferroelectric Capacitor with an Al Buffer Layer
- Authors:
- Xinyu Xie1,
- Jiabin Qi1,* and
- Hui Wang1
- et al.
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