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Journal: Electronics, 2021
Volume: 10
Number: 855
Article:
Optimization of Oxygen Plasma Treatment on Ohmic Contact for AlGaN/GaN HEMTs on High-Resistivity Si Substrate
Authors:
by
Pengfei Li, Shuhua Wei, Xuanwu Kang, Yingkui Zheng, Jing Zhang, Hao Wu, Ke Wei, Jiang Yan and Xinyu Liu
Link:
https://www.mdpi.com/2079-9292/10/7/855
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