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Journal: Electronics, 2021
Volume: 10
Number: 855

Article: Optimization of Oxygen Plasma Treatment on Ohmic Contact for AlGaN/GaN HEMTs on High-Resistivity Si Substrate
Authors: by Pengfei Li, Shuhua Wei, Xuanwu Kang, Yingkui Zheng, Jing Zhang, Hao Wu, Ke Wei, Jiang Yan and Xinyu Liu
Link: https://www.mdpi.com/2079-9292/10/7/855

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