Li, P.; Wei, S.; Kang, X.; Zheng, Y.; Zhang, J.; Wu, H.; Wei, K.; Yan, J.; Liu, X.
Optimization of Oxygen Plasma Treatment on Ohmic Contact for AlGaN/GaN HEMTs on High-Resistivity Si Substrate. Electronics 2021, 10, 855.
https://doi.org/10.3390/electronics10070855
AMA Style
Li P, Wei S, Kang X, Zheng Y, Zhang J, Wu H, Wei K, Yan J, Liu X.
Optimization of Oxygen Plasma Treatment on Ohmic Contact for AlGaN/GaN HEMTs on High-Resistivity Si Substrate. Electronics. 2021; 10(7):855.
https://doi.org/10.3390/electronics10070855
Chicago/Turabian Style
Li, Pengfei, Shuhua Wei, Xuanwu Kang, Yingkui Zheng, Jing Zhang, Hao Wu, Ke Wei, Jiang Yan, and Xinyu Liu.
2021. "Optimization of Oxygen Plasma Treatment on Ohmic Contact for AlGaN/GaN HEMTs on High-Resistivity Si Substrate" Electronics 10, no. 7: 855.
https://doi.org/10.3390/electronics10070855
APA Style
Li, P., Wei, S., Kang, X., Zheng, Y., Zhang, J., Wu, H., Wei, K., Yan, J., & Liu, X.
(2021). Optimization of Oxygen Plasma Treatment on Ohmic Contact for AlGaN/GaN HEMTs on High-Resistivity Si Substrate. Electronics, 10(7), 855.
https://doi.org/10.3390/electronics10070855