Garzon-Fontecha, A.; Castillo, H.A.; Escobar-Rincón, D.; Restrepo-Parra, E.; de la Cruz, W.
Correlation Between Stoichiometry of NbxNy Coatings Produced by DC Magnetron Sputtering with Electrical Conductivity and the Hall Coefficient. Coatings 2019, 9, 196.
https://doi.org/10.3390/coatings9030196
AMA Style
Garzon-Fontecha A, Castillo HA, Escobar-Rincón D, Restrepo-Parra E, de la Cruz W.
Correlation Between Stoichiometry of NbxNy Coatings Produced by DC Magnetron Sputtering with Electrical Conductivity and the Hall Coefficient. Coatings. 2019; 9(3):196.
https://doi.org/10.3390/coatings9030196
Chicago/Turabian Style
Garzon-Fontecha, Angélica, Harvi A. Castillo, Daniel Escobar-Rincón, Elisabeth Restrepo-Parra, and Wencel de la Cruz.
2019. "Correlation Between Stoichiometry of NbxNy Coatings Produced by DC Magnetron Sputtering with Electrical Conductivity and the Hall Coefficient" Coatings 9, no. 3: 196.
https://doi.org/10.3390/coatings9030196
APA Style
Garzon-Fontecha, A., Castillo, H. A., Escobar-Rincón, D., Restrepo-Parra, E., & de la Cruz, W.
(2019). Correlation Between Stoichiometry of NbxNy Coatings Produced by DC Magnetron Sputtering with Electrical Conductivity and the Hall Coefficient. Coatings, 9(3), 196.
https://doi.org/10.3390/coatings9030196