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Coatings 2019, 9(2), 96; https://doi.org/10.3390/coatings9020096

Expanding Plasma Process for Nitriding Mo–Ti Bilayer Thin Films

1
Faculté des Sciences et Techniques, Université de Limoges, CNRS, UMR7315, IRCER, CEC, 12 Rue Atlantis, F-87068 Limoges, France
2
Institut Jean Lamour, CNRS, UMR7198, Université de Lorraine, Site ARTEM, 2 allée A. Guinier, F-54011 Nancy, France
3
Faculté des Sciences et Techniques, Université de Limoges, CNRS, XLIM, UMR6172, 123 av. A. Thomas, F-87060 Limoges, France
*
Author to whom correspondence should be addressed.
Received: 14 December 2018 / Revised: 21 January 2019 / Accepted: 31 January 2019 / Published: 5 February 2019
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Abstract

Owing to the reducing effect of NHx radicals and H species produced in (Ar-N2-H2) expanding plasma, chemical reactions are promoted in thin metal films in contrast with other plasma treatments where the impinging energetic ions play the main role. Multi layers of Mo, Ti, and their nitrides are used in very recent applications such as supercapacitors or solar cells. They combine the interesting properties of the constituents. This work reports on the formation and the structure of Ti nitrides and Mo silicides in Mo–Ti bilayer films coated on Si wafers exposed to (Ar-N2-H2) plasma for 1 to 3 h. Nitrogen diffuses into the surface layers from 400 °C and TiN starts to crystallize from 600 °C. Interdiffusion of Mo, Ti, and Si through Mo–Ti bilayer films gives rise to the formation of Mo–Ti alloys and MoSi2 of hexagonal structure, which transforms into MoSi2 of tetragonal structure at longer treatment durations. A 1 h 30 min plasma exposure at 800 °C leads to the formation of three layers of nearly equal thickness with clear interfaces, which consist of TiN and MoSi2 of nanometric size in the vicinity of the Mo–Ti bilayer film surface. View Full-Text
Keywords: Mo–Ti bilayer films; expanding plasma; Ti nitrides; Mo silicides; X-ray diffraction; Raman spectroscopy; secondary ion mass spectrometry; transmission electron microscopy; scanning electron microscopy Mo–Ti bilayer films; expanding plasma; Ti nitrides; Mo silicides; X-ray diffraction; Raman spectroscopy; secondary ion mass spectrometry; transmission electron microscopy; scanning electron microscopy
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
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Jauberteau, I.; Mayet, R.; Cornette, J.; Carles, P.; Mangin, D.; Bessaudou, A.; Jauberteau, J.L.; Passelergue, A. Expanding Plasma Process for Nitriding Mo–Ti Bilayer Thin Films. Coatings 2019, 9, 96.

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