Influence of Annealing Temperature on the Properties of ZnGa2O4 Thin Films by Magnetron Sputtering
Abstract
1. Introduction
2. Experimental Methods
3. Results
4. Conclusions
Author Contributions
Funding
Acknowledgments
Conflicts of Interest
References
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Temperature | Scherrer’s Method | Williamson-Hall | Energy Gap (eV) | |||
---|---|---|---|---|---|---|
D (mm) | δ × 1015 | D (mm) | δ × 1015 | ε × 10−3 | ||
As-deposited | 11.94 | 6.93 | 13.40 | 5.57 | 53.7 | 4.69 |
500 °C | 13.04 | 5.80 | 14.64 | 4.66 | 3.77 | 4.77 |
600 °C | 17.34 | 3.28 | 19.22 | 2.71 | 8.49 | 4.80 |
700 °C | 24.03 | 1.71 | 26.98 | 1.37 | 9.78 | 4.86 |
800 °C | 25.79 | 1.48 | 28.98 | 1.19 | 7.98 | 4.92 |
900 °C | 27.05 | 1.35 | 30.43 | 1.08 | 2.62 | 4.98 |
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Wang, W.-K.; Liu, K.-F.; Tsai, P.-C.; Xu, Y.-J.; Huang, S.-Y. Influence of Annealing Temperature on the Properties of ZnGa2O4 Thin Films by Magnetron Sputtering. Coatings 2019, 9, 859. https://doi.org/10.3390/coatings9120859
Wang W-K, Liu K-F, Tsai P-C, Xu Y-J, Huang S-Y. Influence of Annealing Temperature on the Properties of ZnGa2O4 Thin Films by Magnetron Sputtering. Coatings. 2019; 9(12):859. https://doi.org/10.3390/coatings9120859
Chicago/Turabian StyleWang, Wei-Kai, Kuo-Feng Liu, Pi-Chuen Tsai, Yi-Jie Xu, and Shih-Yung Huang. 2019. "Influence of Annealing Temperature on the Properties of ZnGa2O4 Thin Films by Magnetron Sputtering" Coatings 9, no. 12: 859. https://doi.org/10.3390/coatings9120859
APA StyleWang, W.-K., Liu, K.-F., Tsai, P.-C., Xu, Y.-J., & Huang, S.-Y. (2019). Influence of Annealing Temperature on the Properties of ZnGa2O4 Thin Films by Magnetron Sputtering. Coatings, 9(12), 859. https://doi.org/10.3390/coatings9120859