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Open AccessArticle

Pulsed Laser Deposition of Indium Tin Oxide Thin Films on Nanopatterned Glass Substrates

1
National Institute of Material Physics, 405A Atomistilor Street, 077125 Bucharest-Magurele, Romania
2
National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, 077125 Bucharest-Magurele, Romania
*
Authors to whom correspondence should be addressed.
Coatings 2019, 9(1), 19; https://doi.org/10.3390/coatings9010019
Received: 5 December 2018 / Revised: 21 December 2018 / Accepted: 25 December 2018 / Published: 29 December 2018
(This article belongs to the Special Issue Current Research in Pulsed Laser Deposition)
Indium tin oxide (ITO) thin films were grown on nanopatterned glass substrates by the pulsed laser deposition (PLD) technique. The deposition was carried out at 1.2 J/cm2 laser fluence, low oxygen pressure (1.5 Pa) and on unheated substrate. Arrays of periodic pillars with widths of ~350 nm, heights of ~250 nm, and separation pitches of ~1100 nm were fabricated on glass substrates using UV nanoimprint lithography (UV-NIL), a simple, cost-effective, and high throughput technique used to fabricate nanopatterns on large areas. In order to emphasize the influence of the periodic patterns on the properties of the nanostructured ITO films, this transparent conductive oxide (TCO) was also grown on flat glass substrates. Therefore, the structural, compositional, morphological, optical, and electrical properties of both non-patterned and patterned ITO films were investigated in a comparative manner. The energy dispersive X-ray analysis (EDX) confirms that the ITO films preserve the In2O3:SnO2 weight ratio from the solid ITO target. The SEM and atomic force microscopy (AFM) images prove that the deposited ITO films retain the pattern of the glass substrates. The optical investigations reveal that patterned ITO films present a good optical transmittance. The electrical measurements show that both the non-patterned and patterned ITO films are characterized by a low electrical resistivity (<2.8 × 10−4). However, an improvement in the Hall mobility was achieved in the case of the nanopatterned ITO films, evidencing the potential applications of such nanopatterned TCO films obtained by PLD in photovoltaic and light emitting devices. View Full-Text
Keywords: PLD; ITO; nanoimprint lithography; coatings PLD; ITO; nanoimprint lithography; coatings
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MDPI and ACS Style

Socol, M.; Preda, N.; Rasoga, O.; Costas, A.; Stanculescu, A.; Breazu, C.; Gherendi, F.; Socol, G. Pulsed Laser Deposition of Indium Tin Oxide Thin Films on Nanopatterned Glass Substrates. Coatings 2019, 9, 19.

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