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Coatings 2018, 8(8), 270; https://doi.org/10.3390/coatings8080270

Investigation of TiO2 Thin Film Deposited by Microwave Plasma Assisted Sputtering and Its Application in 3D Glasses

1
School of OptoElectronic Engineering, Changchun University of Science and Technology, Changchun 130022, China
2
Institute of Thin Films, Sensors and Imaging, School of Engineering and Computing, University of the West of Scotland, PA1 2BE Paisley, UK
3
School of Material Science and Engineering, Chongqing University of Science and Technology, Chongqing 401331, China
*
Authors to whom correspondence should be addressed.
Received: 2 July 2018 / Revised: 23 July 2018 / Accepted: 31 July 2018 / Published: 2 August 2018
(This article belongs to the Special Issue Applications of Optical Thin Film Coatings)
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Abstract

TiO2 deposition using separate regions for sputtering and oxidation is not well investigated. We optimized process parameter for such as oxygen flow and microwave power to produce high quality TiO2 filters for Stereo/3D imaging applications. This deposition technique was chosen for its unique advantages: high deposition rates while increasing the probability of obtaining stoichiometric oxides, reduces possibility of target poisoning and provides better stability of process. Various characterization methods, such as scanning electron microscopy (SEM), atomic force microscopy (AFM), Raman, X-ray diffraction (XRD), transmission spectroscopy, were used in compliment to simulations for detailed analysis of deposited TiO2 thin films. Process parameters were optimized to achieve TiO2 films with low surface scattering and absorption for fabricating multi-passbands interference filter for 3D glasses. From observations and quantitative analysis of surfaces, it was seen that surface roughness increases while oxygen flow or microwave power increases. As the content of anatase phase also increases with higher microwave power and higher oxygen flow, the formation of anatase grains can cause higher surface roughness. Optical analysis of samples validates these trends and provided additional information for absorption trends. Optimized parameters for deposition process are then obtained and the final fabricated 3D glasses filters showed high match to design, within 0.5% range for thickness error. View Full-Text
Keywords: TiO2; thin films; microwave plasma enhanced sputtering; process optimization; interference optical filter; 3D glasses TiO2; thin films; microwave plasma enhanced sputtering; process optimization; interference optical filter; 3D glasses
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Hao, Q.; Fu, X.; Song, S.; Gibson, D.; Li, C.; Chu, H.O.; Shi, Y. Investigation of TiO2 Thin Film Deposited by Microwave Plasma Assisted Sputtering and Its Application in 3D Glasses. Coatings 2018, 8, 270.

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