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Open AccessArticle

Fabrication of Transparent Very Thin SiOx Doped Diamond-Like Carbon Films on a Glass Substrate

1
Thin Film Technology Center, National Central University, No. 300, Chongda Road, Chongli District, Taoyuan 32001, Taiwan
2
Department of Optics and Photonics, National Central University, No. 300, Chongda Road, Chongli District, Taoyuan 32001, Taiwan
3
Department of Mechanical Engineering, National Central University, No. 300, Chongda Road, Chongli District, Taoyuan 32001, Taiwan
4
Instrument Technology Research Center, National Applied Research Laboratories, No. 20. R&D Rd. VI, Hsinchu Science Park, Hsinchu 30076, Taiwan
*
Authors to whom correspondence should be addressed.
Coatings 2018, 8(7), 240; https://doi.org/10.3390/coatings8070240
Received: 5 June 2018 / Revised: 27 June 2018 / Accepted: 4 July 2018 / Published: 7 July 2018
(This article belongs to the Special Issue Advances in Functional Inorganic Coatings)
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Abstract

A novel direct current (DC) magnetron sputtering system via radio frequency (RF) bias with hexamethyldisiloxane (HMDSO) plasma polymerization was developed for the deposition of SiOx-doped diamond-like carbon (DLC) films on a glass substrate. As the RF bias increased, the ratio of intensity of D peak and G peak (I(D)/I(G)) decreased and the G peak shifted to a low position, leading to high hardness and a large portion of sp3 bonds. Additionally, weak sp2 graphite bonds were broken and sp3 diamond bonds formed because the RF bias attracted hydrogen ion bombarding the DLC films. Increasing DC power was helpful to improve the hardness of the DLC films because the proportion of sp3 bonds and the I(D)/I(G) ration was increased. HMDSO was introduced into this process to form SiOx:DLC films with enhanced optical performance. The average transmittance in the visible region of these very thin SiOx:DLC films with a thickness of 37.5 nm was 80.3% and the hardness of the SiOx:DLC films was increased to 7.4 GPa, which was 23.3% higher than that of B270 substrates. View Full-Text
Keywords: SiOx:DLC; hexamethyldisiloxane (HMDSO); RF bias; hardness; plasma polymerization SiOx:DLC; hexamethyldisiloxane (HMDSO); RF bias; hardness; plasma polymerization
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MDPI and ACS Style

Chang, Y.C.; Liao, W.B.; Wei, H.S.; Liao, Y.Y.; Chen, H.P.; Kuo, C.C. Fabrication of Transparent Very Thin SiOx Doped Diamond-Like Carbon Films on a Glass Substrate. Coatings 2018, 8, 240.

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