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Open AccessFeature PaperArticle

Electrochemical Deposition of Ni–W Crack-Free Coatings

Centre for Advanced Technologies and Materials, Ryazan State Radio Engineering University, Gagarin Str. 59/1, Ryazan 390005, Russia
Centre for Physics and Technological Research (CeFITec), Departamento de Física da Faculdade de Ciências e Technologia, Universidade Nova de Lisboa, 2829-516 Caparica, Portugal
Key Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education, School of Physics and Technology, Wuhan University, Wuhan 430072, China
Author to whom correspondence should be addressed.
Coatings 2018, 8(7), 233;
Received: 1 June 2018 / Revised: 21 June 2018 / Accepted: 25 June 2018 / Published: 30 June 2018
PDF [4447 KB, uploaded 30 June 2018]


The main features of electrochemical deposition of coatings based on Ni–W binary alloy in the pulse current mode using pyrophosphate electrolytes were studied. Two electrolytes with a pH of 8.7 and 9.5 were used. The deposition was carried out with the current density varying in the range of 0.01–0.1 A·cm−2, and the duty cycle (the relative pulse duration) was changed within the range 20–100%. The surface morphology and elemental and phase composition of the coatings were studied by scanning electron microscopy, energy-dispersive X-ray microanalysis and X-ray diffractometry. The experimental conditions allowing us to achieve the maximum Faradaic efficiency and W content in the coatings were determined. It was found that the pulse current mode enabled the fabrication of crack-free coatings with a thickness greater than 6 μm. View Full-Text
Keywords: Ni–W binary alloy; crack-free coatings; electrodeposition; pulse current mode; Faradic efficiency; pyrophosphate electrolyte Ni–W binary alloy; crack-free coatings; electrodeposition; pulse current mode; Faradic efficiency; pyrophosphate electrolyte

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Suvorov, D.V.; Gololobov, G.P.; Tarabrin, D.Y.; Slivkin, E.V.; Karabanov, S.M.; Tolstoguzov, A. Electrochemical Deposition of Ni–W Crack-Free Coatings. Coatings 2018, 8, 233.

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