In recent years, nanostructures made of plasmonic materials have held a very important position in the field of science and technology. The traditional metals preferred for plasmonic materials have high resistance loss. Even metals with the highest conductivity (e.g., silver, gold) exhibit excessive loss at optical frequencies to limit the development of optical components. The plasmonic material has been implemented in many fields such as light control, sensors, nanoscale waveguides, and high-density data storage [
1,
2,
3]. However, because of limitations in material properties such as ductility, incompatibility in the manufacturing process, and chemical instability, most of these materials remain in the experimental stage. Recently, transition metal nitrides (TMN) such as titanium nitride (TiN) and zirconium nitride (ZrN) exhibit unique material properties, meaning they have potential as plasmonic materials for various applications [
4,
5,
6]. In addition to the plasmonic properties in the visible and infrared regions, these materials are mechanically and chemically stable and can operate under harsh environmental conditions. With a high melting point and chemical stability at temperatures above 2900 °C, TMNs exhibit a mechanical refractory property and have the same optical property as noble metals [
7]. Owing to their high carrier concentration, which supports negative real permittivity and relatively high carrier mobility, TMNs are candidates to replace noble metals in plasmonic applications [
8]. Therefore, TMN has strong potential as a heat-resistant, lightweight, and efficient optical component, such as in aerospace engineering. In TMN, TiN is the first choice in several areas, including in wear resistant coatings, biomedical areas, and microelectronics [
9]. Combining the benefits of the above TiN, the nanostructure of TiN begins to attract attention. A typical associated application of TiN is in thermophotovoltaic devices, in which TiN is used as an intermediate component to absorb solar irradiation, and heated TiN radiates thermal radiation at a high temperature in a narrow spectrum for efficient absorption by the photovoltaic cell [
10]. Therefore, TiN is formed as a variously shaped nanoparticle with plasmonic effects. TiN square rings of 250 nm × 250 nm are regularly distributed on SiO
2 films that are coated on silicon to provide high absorptance over 85% over wavelengths from 400 to 800 nm [
11]. Such a nanopatterned structure can be heated for four hours at 800 °C. TiN nanoparticles can replace gold particles in thermal therapy, owing to their biocompatibility and wide plasmon resonance band, which is wide enough to support the biological transparency window [
12,
13]. TiN nanorod arrays (NRA) were fabricated for surface-enhanced Raman scattering (SERS) [
14,
15,
16]. The SERS spectra of rhodamine 6G that were adsorbed on fresh TiN NRA substrate and the same substrate that had been stored for 40 days were obtained. After 40 days, the measured intensity of SERS was reduced by 12% relative to that measured on fresh substrate [
17]. The high stability of the Raman spectrum revealed a potential application of TiN NRAs in SERS. As a traditional hard coating, TiN films have been prepared in physical vapor deposition systems using low-voltage electron beam evaporation, high-voltage electron beam evaporation, random arc evaporation steer arc evaporation, and magnetron sputtering [
18,
19,
20,
21]. Because TMNs have been the alternative plasmonic material with refractory property, the optical property associated with localized plasmonic resonance among nanostructure is desired to be observed. Glancing angle deposition (GLAD) is a simple method to sculpture various nanostructures such as slanted rod array, spiral, and zigzag structures by manipulating the orientation of substrate during deposition [
22,
23]. The anisotropic optical property of a nanorod array has been applied to fabricate novel optical devices including polarization beam splitter [
24], achromatic waveplate [
25], and high-efficiency light absorber [
26]. However, the research of nanostructures with TMNs made by GLAD has been getting started in recent years. In a recent work, GLAD was used to grow a tilted TiO
2 nanorod array (NRA) by electron beam evaporation, and the TiO
2 NRA was then transformed into TiN NRA via nitridation with annealing [
27]. In this investigation, glancing angle deposited TiN NRAs were grown in a magnetic sputtering system. Some previous works [
28,
29,
30] used the same method to deposit TiN NRAs by tuning the deposition angle. The morphology of TiN NRA is slightly dependent on the deposition angle. In this work, NRAs were deposited with and without high collimated flux to cause high variation of tilt angle of rods. On the other hand, different thicknesses (rod lengths) of the rods were fabricated, and the corresponding transmittance, reflectance, and extinctance spectra at different angles of incidence were obtained and analyzed. The localized plasmonic resonance corresponding to high-efficiency light extinction was simulated using finite-difference time-domain (FDTD).