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Journal: Coatings, 2016
Volume: 6
Number: 2

Article: TiCl4 Barrier Process Engineering in Semiconductor Manufacturing
Authors: by Tuung Luoh, Yu-Kai Huang, Yung-Tai Hung, Ling-Wuu Yang, Ta-Hone Yang and Kuang-Chao Chen
Link: https://www.mdpi.com/2079-6412/6/1/2

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