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Volume 15
Issue 3
10.3390/coatings15030287
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Article

A Study of the Hall Effect on Doped and Undoped Praseodymium Nickelate Perovskite Thin Films and the Impact of the Reduction Process

by
Alex Misiak
*,
Mufeed Keenari
,
Yohann Breard
,
Wilfrid Prellier
,
Alain Pautrat
and
Adrian David
*
CRISMAT, CNRS, Normandie Université, Département PCI, ENSICAEN, UNICAEN, 6, boulevard du Maréchal Juin, F-14050 Caen, France
*
Authors to whom correspondence should be addressed.
Coatings 2025, 15(3), 287; https://doi.org/10.3390/coatings15030287
Submission received: 10 January 2025 / Revised: 19 February 2025 / Accepted: 27 February 2025 / Published: 1 March 2025
(This article belongs to the Special Issue Recent Progress in Epitaxial Growth of Thin Films and Their Applications)
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Abstract

PrNiO3 and Pr0.8Sr0.2NiO3 epitaxial thin films were deposited by pulsed laser deposition (PLD) on different substrates and studied for Hall effect and resistivity behavior. Conductive behavior is observed in the doped composition, and a normal Hall effect allows to determine charge carrier’s density and mobility. The doped compositions show a high concentration of charge carriers (≈1023 cm−3 at 300 K), and it appears that they can be controlled by the strains. Sr doping enhances the transport properties, leading to a transition from semiconducting to metallic behavior. The impact of the reduction process on charge carrier concentration and mobility is also studied.
Keywords: nickelates; Hall effect; charge carriers; thin films nickelates; Hall effect; charge carriers; thin films

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MDPI and ACS Style

Misiak, A.; Keenari, M.; Breard, Y.; Prellier, W.; Pautrat, A.; David, A. A Study of the Hall Effect on Doped and Undoped Praseodymium Nickelate Perovskite Thin Films and the Impact of the Reduction Process. Coatings 2025, 15, 287. https://doi.org/10.3390/coatings15030287

AMA Style

Misiak A, Keenari M, Breard Y, Prellier W, Pautrat A, David A. A Study of the Hall Effect on Doped and Undoped Praseodymium Nickelate Perovskite Thin Films and the Impact of the Reduction Process. Coatings. 2025; 15(3):287. https://doi.org/10.3390/coatings15030287

Chicago/Turabian Style

Misiak, Alex, Mufeed Keenari, Yohann Breard, Wilfrid Prellier, Alain Pautrat, and Adrian David. 2025. "A Study of the Hall Effect on Doped and Undoped Praseodymium Nickelate Perovskite Thin Films and the Impact of the Reduction Process" Coatings 15, no. 3: 287. https://doi.org/10.3390/coatings15030287

APA Style

Misiak, A., Keenari, M., Breard, Y., Prellier, W., Pautrat, A., & David, A. (2025). A Study of the Hall Effect on Doped and Undoped Praseodymium Nickelate Perovskite Thin Films and the Impact of the Reduction Process. Coatings, 15(3), 287. https://doi.org/10.3390/coatings15030287

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