Zheng, Y.; Xin, X.; Yang, Q.; Zhang, Z.; Zhou, Z.; Ma, Y.
Exploring the Development of Photoresists in Lacquer under the Background of Global Carbon Neutrality: A Mini Review. Coatings 2024, 14, 994.
https://doi.org/10.3390/coatings14080994
AMA Style
Zheng Y, Xin X, Yang Q, Zhang Z, Zhou Z, Ma Y.
Exploring the Development of Photoresists in Lacquer under the Background of Global Carbon Neutrality: A Mini Review. Coatings. 2024; 14(8):994.
https://doi.org/10.3390/coatings14080994
Chicago/Turabian Style
Zheng, Yong, Xin Xin, Qingshuo Yang, Zhijia Zhang, Zhijie Zhou, and Yunlong Ma.
2024. "Exploring the Development of Photoresists in Lacquer under the Background of Global Carbon Neutrality: A Mini Review" Coatings 14, no. 8: 994.
https://doi.org/10.3390/coatings14080994
APA Style
Zheng, Y., Xin, X., Yang, Q., Zhang, Z., Zhou, Z., & Ma, Y.
(2024). Exploring the Development of Photoresists in Lacquer under the Background of Global Carbon Neutrality: A Mini Review. Coatings, 14(8), 994.
https://doi.org/10.3390/coatings14080994