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Article

Deposition of W Nanoparticles by Magnetron Sputtering Gas Aggregation Using Different Amounts of H2/Ar and Air Leaks

by
Tomy Acsente
1,*,
Elena Matei
2,
Valentina Marascu
1,
Anca Bonciu
1,
Veronica Satulu
1 and
Gheorghe Dinescu
1,*
1
National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Street, 077125 Magurele, Romania
2
National Institute of Materials Physics, 405A Atomistilor Street, 077125 Magurele, Romania
*
Authors to whom correspondence should be addressed.
Coatings 2024, 14(8), 964; https://doi.org/10.3390/coatings14080964
Submission received: 28 June 2024 / Revised: 23 July 2024 / Accepted: 25 July 2024 / Published: 1 August 2024
(This article belongs to the Section Plasma Coatings, Surfaces & Interfaces)

Abstract

This work presents the synthesis of tungsten nanoparticles (W NPs) using a cluster source based on magnetron sputtering combined with gas aggregation (MSGA), operated with up to 81% H2 in the hydrogen/argon mixture used as a working gas. The results show that, with up to 41% H2 in discharge, the synthesis rate increases by more than 60 times, rapidly decreasing for over 50% H2 in discharge. The W dust is still produced for H2-dominated discharges (81%), and its deposition rate is small but not negligible (0.02 mg/h). The obtained W NPs are isolated, with the diameter decreasing from 50 nm to 15 nm when the amount of H2 in discharge is smaller than 41%. Over this value, the particles tend to agglomerate, forming structures similar to film-like deposits. Also, the diameter of the dust spots deposited on substrates depends on the H2 content of the discharge. This allows the efficient coating of substrates up to 26 mm wide by translating them in front of the MSGA cluster source exit aperture. Additionally, for 41% H2 in discharge, the influence of synthetic air leaks (0%–8.2%) in discharge was investigated. The deposition rate decreases rapidly (ceasing for around 6% air in discharge), and the obtained nanoparticles tend to agglomerate on the substrate (at 3.3% air content, the dust deposit has the aspect of a near-continuous film). Chemical composition investigations show a pronounced tendency for oxidation, nitridation, and oxynitride formation in the presence of air leaks.
Keywords: MSGA; magnetron sputtering gas aggregation; nanoparticles; hydrogen in discharge; air leaks in discharge; nanometric dust; fusion plasma; hydrogen-dominated discharge MSGA; magnetron sputtering gas aggregation; nanoparticles; hydrogen in discharge; air leaks in discharge; nanometric dust; fusion plasma; hydrogen-dominated discharge

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MDPI and ACS Style

Acsente, T.; Matei, E.; Marascu, V.; Bonciu, A.; Satulu, V.; Dinescu, G. Deposition of W Nanoparticles by Magnetron Sputtering Gas Aggregation Using Different Amounts of H2/Ar and Air Leaks. Coatings 2024, 14, 964. https://doi.org/10.3390/coatings14080964

AMA Style

Acsente T, Matei E, Marascu V, Bonciu A, Satulu V, Dinescu G. Deposition of W Nanoparticles by Magnetron Sputtering Gas Aggregation Using Different Amounts of H2/Ar and Air Leaks. Coatings. 2024; 14(8):964. https://doi.org/10.3390/coatings14080964

Chicago/Turabian Style

Acsente, Tomy, Elena Matei, Valentina Marascu, Anca Bonciu, Veronica Satulu, and Gheorghe Dinescu. 2024. "Deposition of W Nanoparticles by Magnetron Sputtering Gas Aggregation Using Different Amounts of H2/Ar and Air Leaks" Coatings 14, no. 8: 964. https://doi.org/10.3390/coatings14080964

APA Style

Acsente, T., Matei, E., Marascu, V., Bonciu, A., Satulu, V., & Dinescu, G. (2024). Deposition of W Nanoparticles by Magnetron Sputtering Gas Aggregation Using Different Amounts of H2/Ar and Air Leaks. Coatings, 14(8), 964. https://doi.org/10.3390/coatings14080964

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