Chen, X.; Zhang, J.; Gao, L.; Zhang, F.; Ma, M.; Liu, Z.
The Effect of Deposition Temperature on TiN Thin Films for the Electrode Layer of 3D Capacitors Prepared by Atomic Layer Deposition. Coatings 2024, 14, 724.
https://doi.org/10.3390/coatings14060724
AMA Style
Chen X, Zhang J, Gao L, Zhang F, Ma M, Liu Z.
The Effect of Deposition Temperature on TiN Thin Films for the Electrode Layer of 3D Capacitors Prepared by Atomic Layer Deposition. Coatings. 2024; 14(6):724.
https://doi.org/10.3390/coatings14060724
Chicago/Turabian Style
Chen, Xingyu, Jing Zhang, Lingshan Gao, Faqiang Zhang, Mingsheng Ma, and Zhifu Liu.
2024. "The Effect of Deposition Temperature on TiN Thin Films for the Electrode Layer of 3D Capacitors Prepared by Atomic Layer Deposition" Coatings 14, no. 6: 724.
https://doi.org/10.3390/coatings14060724
APA Style
Chen, X., Zhang, J., Gao, L., Zhang, F., Ma, M., & Liu, Z.
(2024). The Effect of Deposition Temperature on TiN Thin Films for the Electrode Layer of 3D Capacitors Prepared by Atomic Layer Deposition. Coatings, 14(6), 724.
https://doi.org/10.3390/coatings14060724