Article Versions Notes

Zhao C, Jiao T, Chen W, Li Z, Dong X, Li Z, Diao Z, Zhang Y, Zhang B, Du G. Preparation of High-Thickness n⁻-Ga₂O₃ Film by MOCVD. Coatings. 2022; 12(5):645. https://doi.org/10.3390/coatings12050645

Zhao, Chunlei, Teng Jiao, Wei Chen, Zeming Li, Xin Dong, Zhengda Li, Zhaoti Diao, Yuantao Zhang, Baolin Zhang, and Guotong Du. 2022. "Preparation of High-Thickness n⁻-Ga₂O₃ Film by MOCVD" Coatings 12, no. 5: 645. https://doi.org/10.3390/coatings12050645

Zhao, C., Jiao, T., Chen, W., Li, Z., Dong, X., Li, Z., Diao, Z., Zhang, Y., Zhang, B., & Du, G. (2022). Preparation of High-Thickness n⁻-Ga₂O₃ Film by MOCVD. Coatings, 12(5), 645. https://doi.org/10.3390/coatings12050645