Wang, R.; Yang, C.; Hao, J.; Shi, J.; Yan, F.; Zhang, N.; Jiang, B.; Shao, W.
Influence of Target Current on Structure and Performance of Cu Films Deposited by Oscillating Pulse Magnetron Sputtering. Coatings 2022, 12, 394.
https://doi.org/10.3390/coatings12030394
AMA Style
Wang R, Yang C, Hao J, Shi J, Yan F, Zhang N, Jiang B, Shao W.
Influence of Target Current on Structure and Performance of Cu Films Deposited by Oscillating Pulse Magnetron Sputtering. Coatings. 2022; 12(3):394.
https://doi.org/10.3390/coatings12030394
Chicago/Turabian Style
Wang, Rong, Chao Yang, Juan Hao, Jing Shi, Fangyuan Yan, Nan Zhang, Bailing Jiang, and Wenting Shao.
2022. "Influence of Target Current on Structure and Performance of Cu Films Deposited by Oscillating Pulse Magnetron Sputtering" Coatings 12, no. 3: 394.
https://doi.org/10.3390/coatings12030394
APA Style
Wang, R., Yang, C., Hao, J., Shi, J., Yan, F., Zhang, N., Jiang, B., & Shao, W.
(2022). Influence of Target Current on Structure and Performance of Cu Films Deposited by Oscillating Pulse Magnetron Sputtering. Coatings, 12(3), 394.
https://doi.org/10.3390/coatings12030394
