Huang, H.; Jiang, L.; Yao, Y.; Zhang, Z.; Wang, Z.; Qi, R.
Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution. Coatings 2021, 11, 599.
https://doi.org/10.3390/coatings11050599
AMA Style
Huang H, Jiang L, Yao Y, Zhang Z, Wang Z, Qi R.
Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution. Coatings. 2021; 11(5):599.
https://doi.org/10.3390/coatings11050599
Chicago/Turabian Style
Huang, Handan, Li Jiang, Yiyun Yao, Zhong Zhang, Zhanshan Wang, and Runze Qi.
2021. "Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution" Coatings 11, no. 5: 599.
https://doi.org/10.3390/coatings11050599
APA Style
Huang, H., Jiang, L., Yao, Y., Zhang, Z., Wang, Z., & Qi, R.
(2021). Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution. Coatings, 11(5), 599.
https://doi.org/10.3390/coatings11050599