Li, X.; Vehkamäki, M.; Heikkilä, M.; Mattinen, M.; Putkonen, M.; Leskelä, M.; Ritala, M.
Atomic Layer Deposition of Insulating AlF3/Polyimide Nanolaminate Films. Coatings 2021, 11, 355.
https://doi.org/10.3390/coatings11030355
AMA Style
Li X, Vehkamäki M, Heikkilä M, Mattinen M, Putkonen M, Leskelä M, Ritala M.
Atomic Layer Deposition of Insulating AlF3/Polyimide Nanolaminate Films. Coatings. 2021; 11(3):355.
https://doi.org/10.3390/coatings11030355
Chicago/Turabian Style
Li, Xinzhi, Marko Vehkamäki, Mikko Heikkilä, Miika Mattinen, Matti Putkonen, Markku Leskelä, and Mikko Ritala.
2021. "Atomic Layer Deposition of Insulating AlF3/Polyimide Nanolaminate Films" Coatings 11, no. 3: 355.
https://doi.org/10.3390/coatings11030355
APA Style
Li, X., Vehkamäki, M., Heikkilä, M., Mattinen, M., Putkonen, M., Leskelä, M., & Ritala, M.
(2021). Atomic Layer Deposition of Insulating AlF3/Polyimide Nanolaminate Films. Coatings, 11(3), 355.
https://doi.org/10.3390/coatings11030355