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Journal: Coatings, 2021
Volume: 11
Number: 117
Article:
Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
Authors:
by
Alexander Rogozhin, Andrey Miakonkikh, Elizaveta Smirnova, Andrey Lomov, Sergey Simakin and Konstantin Rudenko
Link:
https://www.mdpi.com/2079-6412/11/2/117
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