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Article

Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering

by 1,2,†, 1,2,† and 1,2,*
1
Institute of Mechanics, Chinese Academy of Sciences, Beijing 100190, China
2
Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
*
Author to whom correspondence should be addressed.
These authors contributed equally to this work.
Coatings 2020, 10(7), 608; https://doi.org/10.3390/coatings10070608
Received: 4 June 2020 / Revised: 26 June 2020 / Accepted: 27 June 2020 / Published: 28 June 2020
(This article belongs to the Special Issue Mechanical Properties of Advanced Multifunctional Coatings)
A pulsed-dc (direct current) magnetron sputtering with a plasma emission monitor (PEM) system was applied to synthesize Cr-containing hydrogenated amorphous diamond-like carbon (Cr-DLC) films using a large-size industrial Cr target. The plasma emission intensity of a Cr atom at 358 nm wavelength was characterized by optical emission spectrometer (OES). C2H2 gas flow rate was precisely adjusted to obtain a stable plasma emission intensity. The relationships between Cr atom plasma emission intensity and the element concentration, cross-sectional morphology, deposition rate, microstructure, mechanical properties, and tribological properties of Cr-DLC films were investigated. Scanning electron microscope and Raman spectra were employed to analyze the chemical composition and microstructure, respectively. The mechanical and tribological behaviors were characterized and analyzed by using the nano-indentation, scratch test instrument, and ball-on-disk reciprocating friction/wear tester. The results indicate that the PEM system was successfully used in magnetron sputtering for a more stable Cr-DLC deposition process. View Full-Text
Keywords: diamond-like carbon (DLC); plasma emission intensity; magnetron sputtering; tribological performance diamond-like carbon (DLC); plasma emission intensity; magnetron sputtering; tribological performance
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MDPI and ACS Style

Li, G.; Xu, Y.; Xia, Y. Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering. Coatings 2020, 10, 608. https://doi.org/10.3390/coatings10070608

AMA Style

Li G, Xu Y, Xia Y. Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering. Coatings. 2020; 10(7):608. https://doi.org/10.3390/coatings10070608

Chicago/Turabian Style

Li, Guang, Yi Xu, and Yuan Xia. 2020. "Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering" Coatings 10, no. 7: 608. https://doi.org/10.3390/coatings10070608

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