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Nanomaterials 2018, 8(3), 164; https://doi.org/10.3390/nano8030164

Enhancing the Microparticle Deposition Stability and Homogeneity on Planer for Synthesis of Self-Assembly Monolayer

Department of Mechanical Engineering, National Chiao Tung University, Hsinchu 300, Taiwan
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Received: 26 January 2018 / Revised: 11 March 2018 / Accepted: 12 March 2018 / Published: 14 March 2018
(This article belongs to the Special Issue Design and Development of Nanostructured Thin Films)
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Abstract

The deposition stability and homogeneity of microparticles improved with mask, lengthened nozzle and flow rate adjustment. The microparticles can be used to encapsulate monomers, before the monomers in the microparticles can be deposited onto a substrate for nanoscale self-assembly. For the uniformity of the synthesized nanofilm, the homogeneity of the deposited microparticles becomes an important issue. Based on the ANSYS simulation results, the effects of secondary flow were minimized with a lengthened nozzle. The ANSYS simulation was also used to investigate the ring-vortex generation and why the ring vortex can be eliminated by adding a mask with an aperture between the nozzle and deposition substrate. The experimental results also showed that particle deposition with a lengthened nozzle was more stable, while adding the mask stabilized deposition and diminished the ring-vortex contamination. The effects of flow rate and pressure were also investigated. Hence, the deposition stability and homogeneity of microparticles was improved. View Full-Text
Keywords: microparticle deposition; self-assembly; homogeneity; monomer synthesis; mask microparticle deposition; self-assembly; homogeneity; monomer synthesis; mask
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Shih, A.-C.; Han, C.-J.; Kuo, T.-C.; Cheng, Y.-C. Enhancing the Microparticle Deposition Stability and Homogeneity on Planer for Synthesis of Self-Assembly Monolayer. Nanomaterials 2018, 8, 164.

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