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Journal: Nanomaterials, 2018
Volume: 8
Number: 77
77
Article: Heavily Boron-Doped Silicon Layer for the Fabrication of Nanoscale Thermoelectric Devices
Authors: by Zhe Ma, Yang Liu, Lingxiao Deng, Mingliang Zhang, Shuyuan Zhang, Jing Ma, Peishuai Song, Qing Liu, An Ji, Fuhua Yang and Xiaodong Wang
Link: https://www.mdpi.com/2079-4991/8/2/77

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