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Suppressing the Photocatalytic Activity of TiO2 Nanoparticles by Extremely Thin Al2O3 Films Grown by Gas-Phase Deposition at Ambient Conditions

1
Product & Process Engineering, Department of Chemical Engineering, Faculty of Applied Sciences, Delft University of Technology, 2629 HZ Delft, The Netherlands
2
Multi-Phase Mass Transfer & Reaction Engineering Lab, College of Chemical Engineering, Sichuan University, Chengdu 610065, China
3
Delft IMP B.V., Molengraaffsingel 10, 2629 JD Delft, The Netherlands
4
Shanxi Province Key Laboratory of Higee-Oriented Chemical Engineering, North University of China, Taiyuan 030051, China
5
Department of Physics, Quy Nhon University, 170 An Duong Vuong Street, Quy Nhon City 590000, Vietnam
*
Author to whom correspondence should be addressed.
Nanomaterials 2018, 8(2), 61; https://doi.org/10.3390/nano8020061
Received: 23 November 2017 / Revised: 17 January 2018 / Accepted: 19 January 2018 / Published: 24 January 2018
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Abstract

This work investigated the suppression of photocatalytic activity of titanium dioxide (TiO2) pigment powders by extremely thin aluminum oxide (Al2O3) films deposited via an atomic-layer-deposition-type process using trimethylaluminum (TMA) and H2O as precursors. The deposition was performed on multiple grams of TiO2 powder at room temperature and atmospheric pressure in a fluidized bed reactor, resulting in the growth of uniform and conformal Al2O3 films with thickness control at sub-nanometer level. The as-deposited Al2O3 films exhibited excellent photocatalytic suppression ability. Accordingly, an Al2O3 layer with a thickness of 1 nm could efficiently suppress the photocatalytic activities of rutile, anatase, and P25 TiO2 nanoparticles without affecting their bulk optical properties. In addition, the influence of high-temperature annealing on the properties of the Al2O3 layers was investigated, revealing the possibility of achieving porous Al2O3 layers. Our approach demonstrated a fast, efficient, and simple route to coating Al2O3 films on TiO2 pigment powders at the multigram scale, and showed great potential for large-scale production development. View Full-Text
Keywords: ultrathin Al2O3 films; atomic layer deposition; fluidized bed reactor; photocatalytic suppression; TiO2 pigments ultrathin Al2O3 films; atomic layer deposition; fluidized bed reactor; photocatalytic suppression; TiO2 pigments
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

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Guo, J.; Van Bui, H.; Valdesueiro, D.; Yuan, S.; Liang, B.; Van Ommen, J.R. Suppressing the Photocatalytic Activity of TiO2 Nanoparticles by Extremely Thin Al2O3 Films Grown by Gas-Phase Deposition at Ambient Conditions. Nanomaterials 2018, 8, 61.

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