Liao, Y.-K.; Liu, Y.-T.; Hsieh, D.-H.; Shen, T.-L.; Hsieh, M.-Y.; Tzou, A.-J.; Chen, S.-C.; Tsai, Y.-L.; Lin, W.-S.; Chan, S.-W.;
et al. Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition. Nanomaterials 2017, 7, 78.
https://doi.org/10.3390/nano7040078
AMA Style
Liao Y-K, Liu Y-T, Hsieh D-H, Shen T-L, Hsieh M-Y, Tzou A-J, Chen S-C, Tsai Y-L, Lin W-S, Chan S-W,
et al. Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition. Nanomaterials. 2017; 7(4):78.
https://doi.org/10.3390/nano7040078
Chicago/Turabian Style
Liao, Yu-Kuang, Yung-Tsung Liu, Dan-Hua Hsieh, Tien-Lin Shen, Ming-Yang Hsieh, An-Jye Tzou, Shih-Chen Chen, Yu-Lin Tsai, Wei-Sheng Lin, Sheng-Wen Chan,
and et al. 2017. "Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition" Nanomaterials 7, no. 4: 78.
https://doi.org/10.3390/nano7040078
APA Style
Liao, Y.-K., Liu, Y.-T., Hsieh, D.-H., Shen, T.-L., Hsieh, M.-Y., Tzou, A.-J., Chen, S.-C., Tsai, Y.-L., Lin, W.-S., Chan, S.-W., Shen, Y.-P., Cheng, S.-J., Chen, C.-H., Wu, K.-H., Chen, H.-M., Kuo, S.-Y., Charlton, M. D. B., Hsieh, T.-P., & Kuo, H.-C.
(2017). Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition. Nanomaterials, 7(4), 78.
https://doi.org/10.3390/nano7040078
