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Journal: Nanomaterials, 2025
Volume: 15
Number: 783
Article:
Deposition of HfO2 by Remote Plasma ALD for High-Aspect-Ratio Trench Capacitors in DRAM
Authors:
by
Jiwon Kim, Inkook Hwang, Byungwook Kim, Wookyung Lee, Juha Song, Yeonwoong Jung and Changbun Yoon
Link:
https://www.mdpi.com/2079-4991/15/11/783
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