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Journal: Nanomaterials, 2024
Volume: 14
Number: 783
783
Article: Optimizing Josephson Junction Reproducibility in 30 kV E-Beam Lithography: An Analysis of Backscattered Electron Distribution
Authors: by Arthur M. Rebello, Lucas M. Ruela, Gustavo Moreto, Naiara Y. Klein, Eldues Martins, Ivan S. Oliveira, João P. Sinnecker and Francisco Rouxinol
Link: https://www.mdpi.com/2079-4991/14/9/783

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