Order Article Reprints
Journal: NanomaterialsVolume: 14Number: 209
Article: Necking Reduction at Low Temperature in Aspect Ratio Etching of SiO2 at CF4/H2/Ar Plasma
- Authors:
- Hee-Tae Kwon,
- In-Young Bang and
- Jae-Hyeon Kim
- et al.
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