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Journal: Nanomaterials, 2024
Volume: 14
Number: 1386
1386
Article: Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO₂ Deposited by RF Plasma Sputter
Authors: by Seokwon Lim, Yeonghwan Ahn, Beomho Won, Suwan Lee, Hayoung Park, Mohit Kumar and Hyungtak Seo
Link: https://www.mdpi.com/2079-4991/14/17/1386

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