3.1. Layered Magnetic Response Architecture
Typical simulations of the IR absorption of both the GdFe/Ag composite film and the GdFe-SiO
2-Ag nanocavity-shaped metasurface are shown in
Figure 3. The simulated IR absorption data are directly acquired by removing the IR reflectance and transmittance from the incident IR power. An obvious comparison according to the average IR absorption level, such as a very low value of ~13% to the GdFe/Ag composite film with a relatively high value of ~65% to the GdFe-SiO
2-Ag nanocavity-shaped metasurface, can be observed clearly. As shown in
Figure 3a, the simulated IR absorption spectrum of the GdFe/Ag composite film configurated by an optimal Ag thickness of 10 nm and the different GdFe thickness, including 50 nm, 80 nm, and 100 nm, present a similar variance trend, which begins from an initial oscillating descent in a wavelength range of 3–9 μm to a relatively stable presentation of ~4% in a wavelength range of 9–14 μm. Three absorption curves start from different initial values in a sequence of {50 nm—black} < {80 nm—red} < {100 nm—yellow} and also demonstrate an almost identical interval of ~10% at a 3 μm wavelength. It can be obtained that a suitable thickness for GdFe film should be 100 nm to remarkably reduce the surface reflectance.
Next, a SiO
2 dielectric layer with a needed thickness is further added into the structure indicated by
Figure 3a, and the absorption curves obtained by changing the SiO
2 thickness from the initial 900 nm to 1000 nm and then 1100 nm and the final 1500 nm are shown in
Figure 3b. IR absorption is significantly increased after adding a SiO
2 dielectric layer between GdFe and Ag films. Specifically, the average IR absorptivity reaches a relatively high value of 65.45% corresponding to having 900 nm thick SiO
2, while the average IR absorptivity corresponding to a thickness sequence of {1000 nm, 1100 nm, 1500 nm} of SiO
2 film is in a sequence of {59.49%, 55.79%, 56.68%}. In addition, the absorption spectra of the monolayer electric–magnetic composite films are decreased as a whole with a continuous increase in SiO
2 thickness, and the frequency points corresponding to the wave peaks of the absorption spectra will present an obvious red-shifting, but the amplitude will decrease rapidly when the film thickness is increased from 900 nm to 1000 nm. It is worth pointing out that there are two absorption peaks in the near-infrared region corresponding to a SiO
2 film thickness of 900 nm at two wavelengths of ~10.46 μm and ~7.36 μm, respectively, and the absorption peaks are as high as 97.49% and further close to 99.49%.
As the IR absorptivity of the metasurfaces is decreased dramatically at 9 µm after adding a SiO
2 layer, a part of the SiO
2 material is replaced by Si
3N
4 material, and the calculation results for the absorptivity of the metasurface according to simulations are presented in
Figure 4. Because the IR absorptivity of the metasurface is increased again at a wavelength of 9 µm with gradually increasing the thickness of Si
3N
4, a remarkable decrease in the IR absorptivity of the metasurface at 9 µm should be caused by the optical properties of the SiO
2 material utilized.
In order to further significantly improve the IR absorptivity of the metasurface, the number of functional film layers in the layered configuration is gradually increased from a single-layer magnetic composite structure based on GdFe material on a Si wafer. As shown in
Figure 5a, the addition of two SiO
2 layers already significantly improves the IR absorptivity in the 3–7 μm band. The average IR absorptivity of the top SiO
2 layer is ~64.61% when the thickness indicated by
h3 is 300 nm, 71.24% when
h3 is 500 nm, 69.32% when
h3 is 700 nm, and 69.16% when
h3 is 700 nm. And with the increase in the thickness, the IR absorption spectra of the magnetic metasurfaces exhibit an overall trend of initially increasing and then decreasing. When the film thickness is increased from 300 nm to 500 nm, the increase is more significant, and most of the peaks of the absorption spectra are also gradually red-shifted with the increase in the film thickness. When
h3 = 500 nm, three absorption peaks of the red curve correspond to wavelengths of
λ1 = 7.4 μm and
λ2 = 9.61 μm and
λ3 = 12.64 μm, respectively, which correspond to the absorptions as high as ~99.77% and ~65.76% and ~97.73% that can be observed. Finally, a dual-nanocavity architecture is constructed by further depositing a GdFe film with different thicknesses of 30 nm or 50 nm as well as 70 nm or 100 nm over the top of the SiO
2 layer so as to significantly reduce the spectral IR absorption of the metasurfaces, as demonstrated in
Figure 5b.
A comparison of the simulated IR absorption characteristics of the basic structures, including a GdFe/Ag film, a GdFe-SiO
2-Ag nanocavity, a SiO
2/GdFe-SiO
2-Ag nanocavity, and a cascaded GdFe-SiO
2-GdFe/GdFe-SiO
2-Ag nanocavity-shaped metasurface, is given in
Figure 6. As shown, in the wavelength range of 3–14 μm, the overall IR absorption of the SiO
2/GdFe-SiO
2-GdFe composite structure represented by a green curve is increased from ~13% to about 85% compared with that of the GdFe/Ag film represented by a black curve. This indicates that an optical nanocavity-shaped structure remarkably enhances the IR absorption efficiency through spatial magnetic field coherence. The nanocavity shaped according to the top and the bottom magnetic film configuration will firstly stimulate a type of surface “free electron” displacement current in a common surface plasmon mode over the incident surface of each magnetic film and further magnetize the GdFe material intensively, which also means that a surface equivalent eddy current over two endfaces of each magnetic film are generated effectively. A spatial magnetic field resonance mainly restricted in the nanocavity can be generated by coupling the binding eddy currents over the surface of each magnetic film contacting directly with the SiO
2 material. So, a confined resonant enhancement in the spatial electromagnetic wavefields mainly according to the constructive interference based on a layered configuration allows for strong IR absorption in a wide wavelength range of 3–14 μm.
According to the spectral variance trend of the dual nanocavity-shaped metasurface based on a composite architecture of {GdFe/SiO
2/GdFe} + {GdFe/SiO
2/Ag}, an ideal spectral IR absorption with almost 100% can be observed at three wavebands, which can be indicated by three featured wavelength points of 3.19 μm and 8.13 μm and 13.04 μm selected roughly. So, the electric field and magnetic field components of incident beams are further simulated, as shown in
Figure 7. The separated electric field and magnetic field components should exist in different regions and seemingly present a half-wavelength or π phase retard. In a relatively long wavelength region roughly exceeding ~11.5 μm, an instantaneous electric field mainly distributes in the top nanocavity and roughly presents a variance trend from the maximum value of 1 to the minimum value of 0.02 selected. And the magnetic fields are mainly in the bottom nanocavity and also exhibit an opposite variance trend from the initial maximum value of 1.1 × 10
−4 at the bottom to a small value of 0.002 selected roughly. In the intermediate waveband, a similar wavefield distribution can also be observed.
The analysis of the color block variance, as shown in
Figure 7, reveals that the spatial magnetic field distribution in the metasurfaces is consistent with the distribution characteristics of the common plasmon excitation, i.e., the magnetic field strength is the largest in the metal film, and the magnetic field away from the metal film will gradually decay in an exponential form. And the electric field strength in the upper SiO
2 structure will be increased gradually with increasing the wavelength, and at the wavelength of ~13.04 μm, the electric field inside the upper SiO
2 structure is thus extremely strong so as to indicate that the nanocavity formed between the upper and lower magnetic films already excites a surface plasmon over the surface of the magnetic film and thus generates an induced current oscillation on the upper and lower magnetic film surface of the nanocavity, respectively. Due to the displacement currents generated in the nanocavity and at the junction corresponding to the magnetic film, a strong induced magnetic moment is generated, which will confine the incident light field within the layered composite structure, leading to a strong IR absorption at ~13.04 μm wavelength. Since the magnetic and electric fields are in the form of a standing wave inside the nanocavity, the absorptivity of the metasurface can reach a peak when the wavelength of the incident light is five times the length of the nanocavity. For the simulated dual-nanocavity metasurface with a height of 1560 nm, for example, the absorptivity peaks will present at ~7.8 μm, whereas the height of the top nanocavity is 650 nm, so the absorptivity peak will present at about 3.19 μm. So, the absorption of the metasurface will present several obvious peaks near the wavelengths of 13.04 μm, 7.8 μm, and 3.19 μm, which is consistent with those shown in
Figure 6.
So, the spatial distribution morphology above can be viewed as a basic intensity evolution mode (IEM) shaped by merging the electric field and magnetic field subpatterns. But in the short waveband, the spatial electromagnetic wavefields existing in the metasurface obviously present a layered character, which can be viewed as a cascaded IEMs with different amplitudes according to an intensity sequence of {E-Top Nanocavity} > {E-Bottom Nanocavity} and {H-Top Nanocavity} > {H-Bottom Nanocavity}. Generally, the total energy by integrating the electric field and magnetic field components distributed in the composite architecture above are almost the same.
A schematic diagram of a basic GdFe/SiO
2/Ag film system leading to a Si-based nanocavity-shaped metasurface is shown in
Figure 8. The main technological process for preparing the key GdFe film involves two steps: magnetron sputtering (PVD) [
25] and plasma-enhanced chemical vapor deposition [
26] (PECVD) [
27,
28], as shown in
Figure 8a. Generally, the adhesion between SiO
2 and Ag is relatively weak. In order to enhance their adhesion, a 5 nm thick Gr film is firstly sputtered as an intermediate adhesion layer for increasing the adhesion before performing the magnetron sputtering of the Ag film with a 10 nm thickness. And then, a SiO
2 dielectric layer is grown by PECVD and subsequently a GdFe film deposited by similar magnetron sputtering using a GdFe alloy target of 99.9% purity (Gd:Fe = 26:74,
Φ76.2 × 3 mm). The above operation will obviously enhance the performance of the composite films, followed by the application of PECVD to deposit the corresponding thickness of SiO
2, and finally PVD is applied again to complete the preparation of the uppermost GdFe layer. The magnetron sputtering coating equipment is Sputter-Lesker-Lab18 (USTC Center for Micro- and Nanoscale Research and Fabrication), as shown in
Figure 8b. The plasma-enhanced chemical vapor deposition coating equipment is ICPPECVD-SENTECH-SI500 (USTC Center for Micro- and Nanoscale Research and Fabrication), as indicated in
Figure 8c. The created samples are presented in
Figure 8d.
Both the simulated and measured IR absorption characteristics of the Si-based nanocavity-shaped metasurface are obtained by directly removing the reflection (reflectance,
R) and transmission (transmittance,
T) from incident radiations. The IR absorption characteristics of the samples are analyzed by carefully evaluating the variance in transmitted and reflected radiations according to the incident light using a Fourier transform infrared spectrometer of Nicolet iN10 (Huazhong University of Science and Technology Analytical and Testing Center), as shown in
Figure 9a. The test results are shown in
Figure 9b, where the blue curve indicates reflectance and the orange colour indicates transmittance. So, the absorptance is calculated by 1-
R-
T, as presented in
Figure 9c. The graph already exhibits three distinct absorption peaks at the wavelength points of {~3.52 μm, ~8.09 μm, ~12.19 μm} corresponding to the absorption of {~89.1%, ~98.63%, ~98.23%}.
The IR absorption of the GdFe film as a layered composite utilized by us generally exhibits polarization insensitivity due to a structural symmetry in the x- or y-direction mentioned above. The IR absorption behaviors under two polarized TM and TE modes to incident angle θ varied in a range of 0–70° are further simulated, as illustrated in
Figure 10. So, the spectral absorption graphs can be divided by a dotted line at ~30° selected roughly according to the incident angle of the TE and TM components. When θ is less than 30°, the spectral absorption demonstrates a fairly uniform distribution with a normalized absorption of 1 indicated by the color scale attached in the wavelength range of 3.19–14 μm. After exceeding the 30° line, the spectral absorption will present an oscillation trend based on a featured incident angle indicating the IR absorption shutoff as gradually increasing the wavelength, which is demonstrated in
Figure 10a for the TE mode and
Figure 9b for the TM mode. Actually, the spectral absorption oscillation according to the incident angle already happens from the wavelength point of ~3.19 μm, demonstrated by a relatively low average absorption of 0.61. Both the TE and TM components of the incident IR beams still seemingly present a half-wavelength or π phase retard.
As shown, a type of bidirectional metasurface with a broadband and further narrowband radiation absorption corresponding to the top and the bottom surfaces based on alternating overlapping dielectric layers and metal films [
29] has been proposed by Wang et al. When the lightbeams are incident upon the metal layer in the +z direction, the metasurface acts as a narrowband absorber and achieves 99.9% absorption at 771 nm and is then incident upon the dielectric layer in the −z direction as a broadband absorber, thus achieving a stable absorption of more than 90% in a relatively wide wavelength range from 500 nm to 1450 nm. Compared with their work, the double-layer coupled magnetic nanocavity-shaped metasurfaces proposed in this article already present excellent absorption performance in a wider wavelength range of 3~14 μm.
3.2. Patterned GdFe-Based Nanocavity-Shaped Metasurface
Considering the case that the spatial magnetic fields existing in the nanocavities mentioned above are generated mainly by the equivalent eddy currents surrounding each SiO
2 layer between two adjacent GdFe films, as shown in
Figure 2b, an arrayed GdFe micro-diamond cap shaped by patterned segmenting an entire GdFe film leading to a new IMAM architecture is further proposed. The spatial magnetic fields can be continuously enhanced by time-varying electric fields originated from the net charge couple inducted and redistributed locally over the GdFe and Ag films, respectively. Generally, the magnetic induction intensity
B can be tremendously increased around a single pointed top of a basic or element magnetic micro-nano-structure design. And a very high tip density of both the positive and negative net charges compressed towards two opposite tips can be expected. So, the above factors for remarkably enhancing the spatial electromagnetic wavefields will point to an ideal prospect of further regulating the incident IR radiation through the contribution of the patterned GdFe-based nanocavity-shaped architecture by sufficiently generating and then strengthening spatial time-varying electric fields.
So, a thin Cu film of 10 nm thickness is attached over the backside of the top GdFe film with 100 nm thickness, which is fabricated by a conventional technological process. And a GdFe/Cu micro-diamond array is shaped through maintaining an effective wire connection between adjacent GdFe/Cu micro-diamonds along the x-direction and further connecting each cluster of the GdFe/Cu micro-diamonds over two terminals along the y-direction. A new type of GdFe-based nanocavity-shaped metasurface based on an arrayed GdFe/Cu micro-diamond cap is shown in
Figure 11. The layout of the GdFe/Cu micro-diamond cap array over a SiO
2 dielectric layer is shown in
Figure 11a, and a basic or element micro-diamond cap is also shown with key structural parameters including the period P
x = 2.2 μm and P
y = 1.4 μm and both a long and short diagonal length of 2 μm and 760 nm. The adjacent micro-diamond caps are connected by a rectangular strip with a width of 100 nm and a length of 640 nm. A cross-sectional view of a single GdFe nanocavity from a patterned GdFe-based nanocavity-shaped metasurface shown by a SEM photograph in
Figure 11c is given in
Figure 11d. A single GdFe/Cu cap is thus coupled with a bottom Ag film of 10 nm thickness, which also acts as a reflector, so as to form a semi-opened nanocavity filled fully by a SiO
2 dielectric layer with a thickness of 900 nm.
Typical simulations of the spatial electromagnetic wavefield distribution corresponding to a patterned GdFe-based nanocavity-shaped metasurface at several featured wavelength points of ~3.69 μm, ~7.51 μm, ~9.76 μm, and ~12.27 μm are shown in
Figure 12. The spatial electric field and magnetic field components are displayed along the x- and y-direction, respectively.
As shown in
Figure 12a, two bright points with different intensities including a maximum value of ~66 at the wavelength points of ~7.51 μm and ~12.27 μm, which are located at two opposite tips of each GdFe/Cu micro-diamond along the x-direction, also reveal the net charges as the sources of the spatial electric field mainly distributed over the charged Cu film. The relatively weak linear electric field over each apex of a GdFe/Cu composite mask should be generated by a couple of inducted charges located at the tip of the Cu film and the upper apex of the GdFe film. As shown by
Figure 12b, the spatial magnetic field should be composed of two identical parts with a similar appearance corresponding to a top GdFe/Cu micro-diamond and further two similar patterned parts in SiO
2 medium cavities on the both sides of a micro-diamond along the x-direction. So, the appearance of the top spatial magnetic fields can be attributed to a couple of conductive currents towards or away from the central region of a single micro-diamond, leading to a patterned net charge distribution above, and thus present a spectral intensity sequence of {~12.27 μm} > {~7.51 μm} > {~3.69 μm} > {~9.767 μm}. In the y-direction, the spatial electric fields are already divided into two parts by the Cu film. The electric field distributed over the Cu film should be generated by the central net charges of a single micro-diamond, and those existing between the SiO
2 medium cavities mainly originated from the inducted net charges located at the apexes of the GdFe/Cu micro-diamond. According to the measurements and further evaluation, a similar spectral intensity sequence of {~9.767 μm} < {~7.51 μm} < {~12.27 μm} < {~3.69 μm} can be obtained. The spatial magnetic fields that originated from the inductive currents excited over the GdFe/Cu film and also the Ag film are given in a similar spectral intensity sequence of {~9.767 μm} < {~3.69 μm} < {~7.51 μm} < {~12.27 μm}. By the conducted simulations above, a total memory-resident electromagnetic wavefield distribution attributed to a patterned GdFe-based nanocavity-shaped metasurface can be ranked in a spectral intensity sequence of {~9.767 μm} < {~7.51 μm} < {~3.69 μm} < {~12.27 μm}.
The typical distributing characteristics of both the surface net charge and conductive current, as the sources of the spatial electromagnetic wavefields corresponding to the patterned GdFe-based nanocavity-shaped metasurface, are shown in
Figure 13. A transient charged fashion of a single GdFe/Cu micro-diamond cap and a bottom Ag film is illustrated in
Figure 13a. As shown, a couple of the central orientated electric dipoles
P1 stimulated by the surface plasmons excited through a beam of IR radiation incident upon the top surface of the GdFe film will induct other electric dipoles
P2 out from the same negative net charges located at the central region of the Cu mask and continuously a couple of the relatively weak electric dipoles
P3 having the same orientation with that over the top surface along the x-direction. And there is a relatively strong and weak alternate arrangement of the positive net charges according to the central charge distribution over a single micro-diamond and further two inducted linear arrangements over both the Cu and Ag films along the y-direction, respectively. A transient surface conductive current morphology of a single GdFe nanocavity is illustrated in
Figure 13b. As shown, a couple of the conductive currents
J1 with two opposite directions colored by black are also stimulated by the surface plasmons excited from the incident IR beams, then the yellow surface eddy current
J2 inducted by the incident magnetic field component, the surface inducted current
J3 towards two tips over two endfaces of the Cu film colored by green, and then the red conductive current
J4 having an opposite direction of that colored by green over the upper surface of the bottom Ag film only along the x-direction. So, the spatial electromagnetic wavefields can be resonantly accumulated and greatly enhanced in the nanocavity according to constructive interference leading to the spatial magnetic plasmon, which may imply a new IR radiation response and absorption manner being different with the conventional irreversible optothermal sensing and absorbing techniques. A typical fragment corresponding to a spatial plasmon mode with a periodic fashion from the resonant spatial electromagnetic wavefields integrated by the electric field and magnetic field components is shown in
Figure 14. Both the basic spatial electric field and magnetic field appearances at a typical wavelength of 12.27 μm along the x- and y-direction, which are formed by assembling three basic fashions from
Figure 12, are shown in
Figure 14a,b, respectively. A transient surface net charge and current morphology of a partial GdFe-based nanocavity-shaped metasurface involving a basic sealed nanocavity and also a basic semi-opened nanocavity directly exposing the SiO
2 material to the incident radiation, which can be classified as two types of nanocavity architectures, is further illustrated in
Figure 14e.
The technological flow for the preparation of Si-based GdFe nanorhombic array magnetic metasurfaces mainly includes the following: magnetron sputtering coating (PVD), plasma-enhanced chemical vapor deposition (PECVD), direct laser writing (DLW)/electron-beam lithography (EBL), magnetron sputtering coating (PVD), and removing photoresist film or masks, as shown in
Figure 15a. The new IMAM architecture is fabricated by adding a crucial step of the EBL of EBL-JEOL-6300 demonstrated in
Figure 15b. After completing basic operations such as electron beam exposure and development and fixation for defining the structural pattern, the subsequent steps involving the sputtering deposition of GdFe magnetic film followed by common ultrasonic treatment are performed. A methodical process will ensure meticulous separation between the magnetic film and the photoresist, so as to result in an effective creation of the GdFe micro-diamond array. The final sample is exhibited in
Figure 15c.
The typical characteristics of the patterned IMAM sample acquired by us are shown in
Figure 16. A basic GdFe/Cu micro-diamond cap and a SEM photograph of a partial sample are illustrated in
Figure 16b,c, respectively. The IR absorption characteristics in the wavelength range of 3–14 μm are given in
Figure 16a.
As shown, the overall average IR absorption is ~71.7%, which is much lower than that shown in
Figure 9c because of the intrinsic SiO
2 absorption, which is roughly consistent with that indicated at the wavelength of 9.76 μm in
Figure 12. The overall transmittance is almost zero with an overall reflectance of ~30%. It can be noted that the patterned IMAM already achieves a relatively stronger IR absorption, because the joint action of the surface oscillated net charges distributed over the charged metallic films and the surface conductive currents including eddy currents will generate stronger spatial electromagnetic wavefields in an arrayed nanocavity-shaped architecture under the condition of completely eliminating SiO
2 absorption.