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Journal: Nanomaterials, 2024
Volume: 14
Number: 928
928
Article: A Comprehensive Study of NF₃-Based Selective Etching Processes: Application to the Fabrication of Vertically Stacked Horizontal Gate-All-around Si Nanosheet Transistors
Authors: by Xin Sun, Jiayang Li, Lewen Qian, Dawei Wang, Ziqiang Huang, Xinlong Guo, Tao Liu, Saisheng Xu, Liming Wang, Min Xu and David Wei Zhang
Link: https://www.mdpi.com/2079-4991/14/11/928

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