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Journal: Nanomaterials, 2023
Volume: 13
Number: 900
900
Article: Characteristics of Hf_0.5Zr_0.5O₂ Thin Films Prepared by Direct and Remote Plasma Atomic Layer Deposition for Application to Ferroelectric Memory
Authors: by Da Hee Hong, Jae Hoon Yoo, Won Ji Park, So Won Kim, Jong Hwan Kim, Sae Hoon Uhm and Hee Chul Lee
Link: https://www.mdpi.com/2079-4991/13/5/900

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