Order Article Reprints

Lee S, Jeong J, Kang B, Lee S, Lee J, Lim J, Hwang H, Ahn S, Baek R. A Novel Source/Drain Extension Scheme with Laser-Spike Annealing for Nanosheet Field-Effect Transistors in 3D ICs. Nanomaterials. 2023; 13(5):868. https://doi.org/10.3390/nano13050868

Lee, Sanguk, Jinsu Jeong, Bohyeon Kang, Seunghwan Lee, Junjong Lee, Jaewan Lim, Hyeonjun Hwang, Sungmin Ahn, and Rockhyun Baek. 2023. "A Novel Source/Drain Extension Scheme with Laser-Spike Annealing for Nanosheet Field-Effect Transistors in 3D ICs" Nanomaterials 13, no. 5: 868. https://doi.org/10.3390/nano13050868

Lee, S., Jeong, J., Kang, B., Lee, S., Lee, J., Lim, J., Hwang, H., Ahn, S., & Baek, R. (2023). A Novel Source/Drain Extension Scheme with Laser-Spike Annealing for Nanosheet Field-Effect Transistors in 3D ICs. Nanomaterials, 13(5), 868. https://doi.org/10.3390/nano13050868