Jalil, A.R.; Hou, X.; Schüffelgen, P.; Bae, J.H.; Neumann, E.; Mussler, G.; Plucinski, L.; Grützmacher, D.
Phase-Selective Epitaxy of Trigonal and Orthorhombic Bismuth Thin Films on Si (111). Nanomaterials 2023, 13, 2143.
https://doi.org/10.3390/nano13142143
AMA Style
Jalil AR, Hou X, Schüffelgen P, Bae JH, Neumann E, Mussler G, Plucinski L, Grützmacher D.
Phase-Selective Epitaxy of Trigonal and Orthorhombic Bismuth Thin Films on Si (111). Nanomaterials. 2023; 13(14):2143.
https://doi.org/10.3390/nano13142143
Chicago/Turabian Style
Jalil, Abdur Rehman, Xiao Hou, Peter Schüffelgen, Jin Hee Bae, Elmar Neumann, Gregor Mussler, Lukasz Plucinski, and Detlev Grützmacher.
2023. "Phase-Selective Epitaxy of Trigonal and Orthorhombic Bismuth Thin Films on Si (111)" Nanomaterials 13, no. 14: 2143.
https://doi.org/10.3390/nano13142143
APA Style
Jalil, A. R., Hou, X., Schüffelgen, P., Bae, J. H., Neumann, E., Mussler, G., Plucinski, L., & Grützmacher, D.
(2023). Phase-Selective Epitaxy of Trigonal and Orthorhombic Bismuth Thin Films on Si (111). Nanomaterials, 13(14), 2143.
https://doi.org/10.3390/nano13142143