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Journal: Nanomaterials, 2022
Volume: 12
Number: 4457

Article: Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled
Authors: by Won-nyoung Jeong, Young-seok Lee, Chul-hee Cho, In-ho Seong and Shin-jae You
Link: https://www.mdpi.com/2079-4991/12/24/4457

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