Order Article Reprints

Zhou Y, Wang D, Li Y, Jing L, Li S, Chen X, Zhang B, Shuai W, Tao R, Lu X, et al. Critical Effect of Oxygen Pressure in Pulsed Laser Deposition for Room Temperature and High Performance Amorphous In-Ga-Zn-O Thin Film Transistors. Nanomaterials. 2022; 12(24):4358. https://doi.org/10.3390/nano12244358

Zhou, Yue, Dao Wang, Yushan Li, Lixin Jing, Shuangjie Li, Xiaodan Chen, Beijing Zhang, Wentao Shuai, Ruiqiang Tao, Xubing Lu, and et al. 2022. "Critical Effect of Oxygen Pressure in Pulsed Laser Deposition for Room Temperature and High Performance Amorphous In-Ga-Zn-O Thin Film Transistors" Nanomaterials 12, no. 24: 4358. https://doi.org/10.3390/nano12244358

Zhou, Y., Wang, D., Li, Y., Jing, L., Li, S., Chen, X., Zhang, B., Shuai, W., Tao, R., Lu, X., & Liu, J. (2022). Critical Effect of Oxygen Pressure in Pulsed Laser Deposition for Room Temperature and High Performance Amorphous In-Ga-Zn-O Thin Film Transistors. Nanomaterials, 12(24), 4358. https://doi.org/10.3390/nano12244358