Proust, V.; Kirscher, Q.; Nguyen, T.K.N.; Obringer, L.; Ishii, K.; Rault, L.; Demange, V.; Berthebaud, D.; Ohashi, N.; Uchikoshi, T.;
et al. Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning. Nanomaterials 2022, 12, 2334.
https://doi.org/10.3390/nano12142334
AMA Style
Proust V, Kirscher Q, Nguyen TKN, Obringer L, Ishii K, Rault L, Demange V, Berthebaud D, Ohashi N, Uchikoshi T,
et al. Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning. Nanomaterials. 2022; 12(14):2334.
https://doi.org/10.3390/nano12142334
Chicago/Turabian Style
Proust, Vanessa, Quentin Kirscher, Thi Kim Ngan Nguyen, Lisa Obringer, Kento Ishii, Ludivine Rault, Valérie Demange, David Berthebaud, Naoki Ohashi, Tetsuo Uchikoshi,
and et al. 2022. "Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning" Nanomaterials 12, no. 14: 2334.
https://doi.org/10.3390/nano12142334
APA Style
Proust, V., Kirscher, Q., Nguyen, T. K. N., Obringer, L., Ishii, K., Rault, L., Demange, V., Berthebaud, D., Ohashi, N., Uchikoshi, T., Berling, D., Soppera, O., & Grasset, F.
(2022). Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning. Nanomaterials, 12(14), 2334.
https://doi.org/10.3390/nano12142334
